SAMSUNG AUSTIN SEMICONDUCTOR, L.P.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 6356
 
 
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 561
 
 
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 2204
 
 
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 2102
 
 
 
B01D SEPARATION 1133
 
 
 
B01J CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS 1108
 
 
 
B05B SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES 163
 
 
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 157
 
 
 
C01B NON-METALLIC ELEMENTS; COMPOUNDS THEREOF178
 
 
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1100

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9385018 Semiconductor manufacturing equipment with trace elements for improved defect tracing and methods of manufactureJan 07, 13Jul 05, 16[H01L, G01N]
9287162 Forming vias and trenches for self-aligned contacts in a semiconductor structureJan 10, 13Mar 15, 16[H01L]
9111998 Multi-level stack having multi-level contact and methodApr 04, 12Aug 18, 15[H01L]
8951095 High selectivity slurry delivery systemApr 25, 05Feb 10, 15[B24B]
8887663 Method and apparatus for fabrication of carbon nanotubes using an electrostatically charged substrate and linerSep 27, 11Nov 18, 14[C01B, H01L, B82Y, B05B, B01J, D01F]
8586267 Removable transparent membrane for a pellicleSep 12, 11Nov 19, 13[G03F]
8580044 Apparatus for agitating and evacuating byproduct dust from a semiconductor processing chamberAug 13, 10Nov 12, 13[B08B]
8383323 Selective imaging through dual photoresist layersSep 13, 06Feb 26, 13[G03F]
8323411 Semiconductor workpiece apparatusJun 06, 05Dec 04, 12[C23C, H01L, C23F]
7636611 Fuzzy logic system for process control in chemical mechanical polishingOct 28, 05Dec 22, 09[G06F]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2012/0189,421 PARALLEL MULTI WAFER AXIAL SPIN CLEAN PROCESSING USING SPIN CASSETTE INSIDE MOVABLE PROCESS CHAMBERAbandonedJan 21, 11Jul 26, 12[B23Q, B23B, H01L]
7759600 Rupture resistant plasma tubeExpiredMar 15, 06Jul 20, 10[B23K]
2008/0289,766 Hot edge ring apparatus and method for increased etch rate uniformity and reduced polymer buildupAbandonedMay 22, 07Nov 27, 08[H01L]
7404757 Apparatus and method for breaking in multiple pad conditioning disks for use in a chemical mechanical polishing systemExpiredJun 22, 04Jul 29, 08[B24B]
2006/0108,069 Plasma reaction chamber and captive silicon electrode plate for processing semiconductor wafersAbandonedNov 19, 04May 25, 06[C23F]
6939132 Semiconductor workpiece apparatusExpiredSep 30, 02Sep 06, 05[0000]
2005/0088,001 Polish pad toolAbandonedOct 24, 03Apr 28, 05[B25B]
6597117 Plasma coilExpiredNov 30, 01Jul 22, 03[H01J]
6403455 Methods of fabricating a memory deviceExpiredAug 31, 00Jun 11, 02[H01L]

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