PRIMAXX, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 2360
 
  
 
B44C PRODUCING DECORATIVE EFFECTS 133
 
  
 
C03C CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS159
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 135
 
  
 
F26B DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM 129

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
7771563 Systems and methods for achieving isothermal batch processing of substrates used for the production of micro-electro-mechanical-systemsNov 18, 04Aug 10, 10[H01L, C03C]
7431853 Selective etching of oxides from substratesMar 08, 06Oct 07, 08[C23F]
5439553 Controlled etching of oxides via gas phase reactionsMar 30, 94Aug 08, 95[H01L]
5234540 Process for etching oxide films in a sealed photochemical reactorApr 30, 92Aug 10, 93[C03C, B44C]
5228206 Cluster tool dry cleaning systemJan 15, 92Jul 20, 93[F26B]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2004/0028,810 Chemical vapor deposition reactor and method for utilizing vapor vortexAbandonedDec 04, 02Feb 12, 04[C23C]
2003/0116,091 Chemical vapor deposition vaporizerAbandonedDec 04, 02Jun 26, 03[C23C]
2003/0118,947 System and method for selective deposition of precursor materialAbandonedDec 04, 02Jun 26, 03[G03C]
6428847 Vortex based CVD reactorExpiredOct 16, 00Aug 06, 02[C23C]
6391804 Method and apparatus for uniform direct radiant heating in a rapid thermal processing reactorExpiredJun 09, 00May 21, 02[H01L]
6261373 Method and apparatus for metal oxide chemical vapor deposition on a substrate surfaceExpiredJul 14, 99Jul 17, 01[C23C]
6231933 Method and apparatus for metal oxide chemical vapor deposition on a substrate surfaceExpiredMar 18, 99May 15, 01[C23C]
6116184 Method and apparatus for misted liquid source deposition of thin film with reduced mist particle sizeExpiredNov 17, 97Sep 12, 00[C23C]

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