PLASMA-THERM LLC
Patent Owner
Stats
- 43 US PATENTS IN FORCE
- 1 US APPLICATIONS PENDING
- Mar 06, 2018 most recent publication
Details
- 43 Issued Patents
- 0 Issued in last 3 years
- 0 Published in last 3 years
- 1,107 Total Citation Count
- Jul 31, 1998 Earliest Filing
- 8 Expired/Abandoned/Withdrawn Patents
Patent Activity in the Last 10 Years
Technologies
Intl Class
Technology
Matters
Rank in Class
Top Patents (by citation)
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Recent Publications
Publication #
Title
Filing Date
Pub Date
Intl Class
2017/0025,311 Method and Apparatus for Plasma Dicing a Semi-conductor WaferOct 06, 16Jan 26, 17[H01J, H01L]
Recent Patents
Patent #
Title
Filing Date
Issue Date
Intl Class
9911654 Method and apparatus for plasma dicing a semi-conductor waferOct 06, 16Mar 06, 18[H01J, H01L]
9711406 Method and apparatus for plasma dicing a semi-conductor waferOct 06, 16Jul 18, 17[H01J, H01L]
RE46339 Method and apparatus for plasma dicing a semi-conductor waferSep 15, 15Mar 14, 17[H01J, H01L]
9564366 Method and apparatus for plasma dicing a semi-conductor waferDec 18, 15Feb 07, 17[H01J, H01L]
9496177 Method and apparatus for plasma dicing a semi-conductor waferMay 26, 15Nov 15, 16[H01J, H01L]
9343365 Method and apparatus for plasma dicing a semi-conductor waferAug 29, 13May 17, 16[H01J, H01L]
9202720 Method and apparatus for plasma dicing a semi-conductor waferFeb 11, 13Dec 01, 15[H01J, H01L]
9202721 Method and apparatus for plasma dicing a semi-conductor waferFeb 10, 14Dec 01, 15[H01J, H01L]
9202737 Method and apparatus for plasma dicing a semi-conductor waferJun 02, 15Dec 01, 15[H01J, H01L]
Expired/Abandoned/Withdrawn Patents
Patent #
Title
Status
Filing Date
Issue/Pub Date
Intl Class
2015/0255,297 Method and Apparatus for Plasma Dicing a Semi-conductor WaferAbandonedMay 26, 15Sep 10, 15[H01L]
2007/0217,119 Apparatus and Method for Carrying SubstratesAbandonedMar 05, 07Sep 20, 07[C23C, B23B, H01L]
2007/0175,856 Notch-Free Etching of High Aspect SOI Structures Using A Time Division Multiplex Process and RF Bias ModulationAbandonedApr 16, 07Aug 02, 07[C23C, H01L, C23F]
2006/0006,139 Selection of wavelengths for end point in a time division multiplexed processAbandonedAug 23, 05Jan 12, 06[G01L]
2005/0112,891 Notch-free etching of high aspect SOI structures using a time division multiplex process and RF bias modulationAbandonedOct 18, 04May 26, 05[H01L]
2003/0077,910 Etching of thin damage sensitive layers using high frequency pulsed plasmaAbandonedOct 22, 02Apr 24, 03[C23C, H01L, C23F]
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