OCG MICROELECTRONIC MATERIALS, INC.
Patent Owner
Stats
- 0 US PATENTS IN FORCE
- 0 US APPLICATIONS PENDING
- Dec 30, 1997 most recent publication
Details
- 0 Issued Patents
- 0 Issued in last 3 years
- 0 Published in last 3 years
- 531 Total Citation Count
- May 23, 1983 Earliest Filing
- 52 Expired/Abandoned/Withdrawn Patents
Patent Activity in the Last 10 Years
Technologies
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Recent Publications
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Recent Patents
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Expired/Abandoned/Withdrawn Patents
Patent #
Title
Status
Filing Date
Issue/Pub Date
Intl Class
5702852 Multi-color method of toner transfer using non-marking toner and high pigment marking tonerExpiredDec 14, 95Dec 30, 97[G03G]
5399200 Module in an integrated delivery system for chemical vapors from liquid sourcesExpiredMar 10, 94Mar 21, 95[C23C]
5380881 Acid labile solution inhibitors and positive- and negative-acting photosensitive composition based thereonExpiredJan 22, 93Jan 10, 95[C07D]
5254440 Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions and processes of forming resist imagesExpiredSep 30, 92Oct 19, 93[G03F]
5250392 Process of developing a negative-working radiation-sensitive photoresist containing cyclized rubber polymer and contrast enhancing azo dyeExpiredJan 25, 93Oct 05, 93[G03C, G03F]
5250653 Phenolic novolak resin compositions containing 5-indanol and their use in radiation-sensitive compositionsExpiredFeb 22, 93Oct 05, 93[C08G, G03F]
5240811 Photogenerated polycarbodiimides from poly(tetrazole-5-thiones) and use in the preparation of coatings and deep-UV photoresistsExpiredApr 15, 91Aug 31, 93[G03F]
5239122 Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositionsExpiredSep 30, 92Aug 24, 93[C07C]
5234789 Polylactide compounds as sensitivity enhancers for radiation sensitive mixtures containing o-quinonediazide photoactive compoundsExpiredMar 19, 92Aug 10, 93[G03C, G03F]
5234795 Process of developing an image-wise exposed resist-coated substrateExpiredNov 23, 92Aug 10, 93[G03F]
5232819 Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositionsExpiredDec 03, 92Aug 03, 93[G03F]
5225318 Selected photoactive methylolated cyclohexanol compounds and their use in forming positive resist image patternsExpiredJun 29, 92Jul 06, 93[G03F]
5219701 Positive photoresist containing 1,2-naphthoquinone-diazide-5-sulfonyl tris ester of 1,3,5-trihydroxybenzene and aromatic hydroxy compound sensitizerExpiredOct 02, 91Jun 15, 93[G03C, G03F]
5219714 Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixturesExpiredSep 14, 92Jun 15, 93[C07C, G03F]
5210003 Acid labile dissolution inhibitors and positive- and negative-acting photosensitive composition based thereonExpiredSep 09, 91May 11, 93[G03C]
5206110 Negative-working radiation-sensitive mixtures containing cyclized rubber polymer and contrast enhancing azo dyeExpiredFeb 04, 91Apr 27, 93[G03C, G03F]
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