Nichigo-Morton Co., Ltd.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
B32B LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM2155
 
  
 
B29C SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING 1124
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1103
 
  
 
H05K PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS 1155

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8899291 Laminating apparatusJul 19, 11Dec 02, 14[H01L, B29C, B32B, H05K]
6242158 Photosensitive resin composition and photosensitive element using the resin compositionAug 28, 98Jun 05, 01[G03F]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
6248506 Aqueous developing solutions for reduced developer residueExpiredDec 04, 98Jun 19, 01[G03F]
6207347 Photoimageable composition having improved flexibilityExpiredApr 29, 99Mar 27, 01[G03F]
6063550 Aqueous developing solutions for reduced developer residueExpiredApr 29, 98May 16, 00[G03F]
6004725 Photoimageable compositionsExpiredJul 17, 98Dec 21, 99[G03F]
5952153 Photoimageable composition having improved flexibility, adhesion and stripping characteristicsExpiredDec 01, 97Sep 14, 99[G03C]
5952154 Photoimageable composition having improved flexibilityExpiredMay 29, 98Sep 14, 99[G03F]
5939238 Photoimageable composition having improved photoinitiator systemExpiredJun 02, 98Aug 17, 99[G03C]
5939239 Photoimageable compositions containing photopolymerizable urethane oligomers and dibenzoate plasticizersExpiredDec 01, 97Aug 17, 99[G03F]
5922522 Aqueous developing solutions for reduced developer residueExpiredApr 29, 98Jul 13, 99[G03F]

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