NOMURA MICRO SCIENCE CO., LTD.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
B01D SEPARATION 4130
 
  
 
C02F TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE 352
 
  
 
C11D DETERGENT COMPOSITIONS 362
 
  
 
B01F MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING 240
 
  
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 256
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 2360
 
  
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 186
 
  
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 165
 
  
 
B29C SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING 1124
 
  
 
C23G CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS 112

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0216,800 FUNCTIONAL WATER PRODUCING APPARATUS AND FUNCTIONAL WATER PRODUCING METHODJan 27, 17Aug 03, 17[B01F, C11D]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8278219 Method for purifying chemical added with chelating agentNov 30, 07Oct 02, 12[H01L]
8202429 Method for recovering a used slurryAug 12, 09Jun 19, 12[B08B, C02F, B01D]
7805983 Method for measuring the number of fine particles in ultrapure water and method for manufacturing a filtration device for measuring the number of fine particles in ultrapure waterJan 18, 06Oct 05, 10[G01N, B01D]
7625262 Material for purification of semiconductor polishing slurry, module for purification of semiconductor polishing slurry and process for producing semiconductor polishing slurryMar 18, 04Dec 01, 09[B24B]
7491302 Electrolytic gas generation method and electrolytic gas generation deviceApr 01, 04Feb 17, 09[C25B, C02F]
7043394 Method and device for measuring fine particles in ultrapure waterApr 25, 03May 09, 06[G01D]
6851873 Method and apparatus for removing organic filmsOct 14, 03Feb 08, 05[G03D]
6350376 Reductive heat exchange water and heat exchange system using such waterMar 16, 00Feb 26, 02[C02F, B01D]
5681398 Silicone wafer cleaning methodMar 17, 95Oct 28, 97[B08B, C23G]
5635463 Silicon wafer cleaning fluid with HN0.sub.3, HF, HCl, surfactant, and waterJul 19, 95Jun 03, 97[C11D]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2013/0333,299 ABRASIVE RECOVERY METHOD AND ABRASIVE RECOVERY DEVICEAbandonedAug 21, 13Dec 19, 13[B24B]
2011/0259,818 FILTER MEDIA FOR LIQUID PURIFICATION TO REMOVE TRACE METALSAbandonedApr 22, 11Oct 27, 11[B01D]
2010/0087,007 METHOD FOR QUANTITATIVE DETERMINATION OF NICKEL AND/OR COPPER AND EQUIPMENT TO BE USED IN THE METHODAbandonedNov 26, 07Apr 08, 10[G01N, B01J]
6896927 Method of preventing organic contamination from the atmosphere of electronic device substrates and electronic device substrates treated therewithExpiredDec 13, 02May 24, 05[B05D]
6699330 Method of removing contamination adhered to surfaces and apparatus used thereforExpiredOct 02, 00Mar 02, 04[C23G]
6696228 Method and apparatus for removing organic filmsExpiredOct 21, 02Feb 24, 04[C03C, B08B, C23G, G03F]
6609564 Reductive heat exchange water and heat exchange system using such waterExpiredDec 19, 01Aug 26, 03[G05D]
6187201 System for producing ultra-pure waterExpiredNov 04, 96Feb 13, 01[B01D]
6059887 Process for cleaning the interior of semiconductor substrateExpiredApr 03, 98May 09, 00[C03C]
5772738 Multifunctional air filter and air-circulating clean unit with the same incorporated thereinExpiredMay 30, 96Jun 30, 98[B01D]
5643404 Method for examination of silicon wafer surface defectsExpiredSep 18, 95Jul 01, 97[H01L]
5147605 Method for the sterilization of ultrapure water lineExpiredMar 05, 90Sep 15, 92[A01N]
4863608 Photocatalytic treatment of water for the preparation of ultra pure waterExpiredMar 09, 88Sep 05, 89[C02F]
4761074 Method for measuring impurity concentrations in a liquid and an apparatus thereforExpiredMar 24, 87Aug 02, 88[G01N]

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