MicroSi, Inc.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 2102
 
  
 
G03C PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES 145

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
5362607 Method for making a patterned resist substrate compositeFeb 14, 94Nov 08, 94[G03F]
5196295 Spin castable mixtures useful for making deep-UV contrast enhancement layersMay 07, 91Mar 23, 93[G03C, G03F]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
6004675 Optical glass fiberExpiredSep 01, 92Dec 21, 99[D02G]
5310619 Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavableExpiredMay 13, 92May 10, 94[G03F]
5108874 Composite useful in photolithographyExpiredAug 23, 89Apr 28, 92[G03C, G03F]
5106723 Contrast enhancement layer compositions, alkylnitrones, and useExpiredJan 08, 91Apr 21, 92[G03C]
5002993 Contrast enhancement layer compositions, alkylnitrones, and useExpiredDec 04, 89Mar 26, 91[C08K]
4990665 DiarylnitronesExpiredJul 17, 89Feb 05, 91[C07C]
4968757 Soluble silicone-imide copolymersExpiredFeb 06, 87Nov 06, 90[C08G]
4931380 Pre-exposure method for increased sensitivity in high contrast resist development of positive working diazo ketone photoresistExpiredNov 18, 88Jun 05, 90[G03F]
4859789 DiarylnitronesExpiredMar 05, 86Aug 22, 89[C07C]
4855199 Photopatterned product of silicone polyamic acid on a transparent substrateExpiredAug 08, 88Aug 08, 89[G03C]
4824769 High contrast photoresist developerExpiredApr 28, 87Apr 25, 89[B03C]
4822722 Process of using high contrast photoresist developer with enhanced sensitivity to form positive resist imageExpiredNov 06, 87Apr 18, 89[G03F]
4782009 Method of coating and imaging photopatternable silicone polyamic acidExpiredApr 03, 87Nov 01, 88[G03C]
4771422 Priority user protection in multiple priority switching systemsExpiredDec 04, 86Sep 13, 88[H04J]
4723030 Moderated reduction reactions for producing arylhydroxylaminesExpiredAug 05, 85Feb 02, 88[C07C]
4710449 High contrast low metal ion positive photoresist developing method using aqueous base solutions with surfactantsExpiredJan 29, 86Dec 01, 87[G03C, G03F]
4709107 Process for producing nitronesExpiredOct 11, 85Nov 24, 87[C07C]
4702996 Method of enhancing the contrast of images and materials thereforExpiredMay 17, 85Oct 27, 87[G03C]
4701511 Method of making diglyme soluble siloxane-imide copolymersExpiredOct 19, 84Oct 20, 87[C08G]
4677049 Spin castable photobleachable layer forming compositionsExpiredNov 28, 84Jun 30, 87[G03C]

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