MOLECULAR IMPRINTS, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
B29C SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING 7750
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 2975
 
  
 
B82Y SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE  OR TREATMENT OF NANO-STRUCTURES2530
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 22340
 
  
 
B28B SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG OR MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER 1811
 
  
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 1275
 
  
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 1186
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS990
 
  
 
B29D PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE 651
 
  
 
C03C CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS654

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0056,614 MONOLITHIC HIGH REFRACTIVE INDEX PHOTONIC DEVICESAug 23, 17Mar 01, 18[B29C, B29D, G02B]
2018/0030,598 NANO IMPRINTING WITH REUSABLE POLYMER TEMPLATE WITH METALLIC OR OXIDE COATINGOct 10, 17Feb 01, 18[C23C, B82Y, B29C, B41C, G03F]
2018/0031,976 SUBSTRATE LOADING IN MICROLITHOGRAPHYJun 02, 17Feb 01, 18[G03F]
2015/0014,877 IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHODJul 02, 14Jan 15, 15[B29C]
2014/0319,727 PATTERNING OF NON-CONVEX SHAPED NANOSTRUCTURESApr 08, 14Oct 30, 14[B29C]
2014/0117,574 Strain and Kinetics Control During Separation Phase of Imprint ProcessJan 08, 14May 01, 14[B82Y, B29C]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9816186 Nano imprinting with reusable polymer template with metallic or oxide coatingOct 26, 15Nov 14, 17[C23C, B82Y, B29C, B41C, G03G, G03F]
9770850 Imprint apparatus and article manufacturing methodApr 16, 14Sep 26, 17[B29C, B29K, G03F, B29L]
9725807 Nano imprinting with reusable polymer template with metallic or oxide coatingOct 26, 15Aug 08, 17[C23C, B82Y, B29C, B41C, G03G, G03F]
9616614 Large area imprint lithographyFeb 21, 13Apr 11, 17[B82Y, B29C, G03F]
9529274 Chucking system with recessed support featureDec 15, 14Dec 27, 16[B82Y, B25B, G03B, G03F]
9514950 Methods for uniform imprint pattern transfer of sub-20 nm featuresDec 30, 14Dec 06, 16[H01L, G03F]
9452574 Fabrication of seamless large area master templates for imprint lithography using step and repeat toolsDec 19, 12Sep 27, 16[B82Y, B29C, B29D, G03F]
9323143 Controlling template surface composition in nano-imprint lithographyFeb 03, 09Apr 26, 16[B82Y, G03F]
9170485 Nano imprinting with reusable polymer template with metallic or oxide coatingMar 17, 14Oct 27, 15[B82Y, B29C, G03F]
9164375 Dual zone template chuckJun 17, 10Oct 20, 15[B82Y, G03F]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2014/0212,534 Fabrication of High-Throughput Nano-Imprint Lithography TemplatesAbandonedJan 30, 13Jul 31, 14[C23C, B29C]
2014/0034,229 Method for Adhering Materials TogetherAbandonedOct 08, 13Feb 06, 14[B32B]
2014/0021,167 Large Area Patterning of Nano-Sized ShapesAbandonedSep 09, 13Jan 23, 14[G03F]
2012/0288,686 REDUCED RESIDUAL FORMATION IN ETCHED MULTI-LAYER STACKSAbandonedJul 11, 12Nov 15, 12[B05D, C08F, B32B]
2012/0214,066 High Aspect Ratio Patterning of SiliconAbandonedFeb 16, 12Aug 23, 12[B82Y, H01M]
2012/0189,780 Controlling Thickness of Residual LayerAbandonedMar 26, 12Jul 26, 12[C08J, B05D]
8215946 Imprint lithography system and methodExpiredOct 20, 09Jul 10, 12[B29C, B29D]
2012/0070,572 Vapor Delivery System For Use in Imprint LithographyAbandonedSep 08, 11Mar 22, 12[C23C, B05D]
2012/0058,258 METHODS OF CLEANING HARD DRIVE DISK SUBSTRATES FOR NANOIMPRINT LITHOGRAPHYAbandonedSep 07, 11Mar 08, 12[B05D, B08B, G11B]
2011/0277,833 BACKSIDE CONTACT SOLAR CELLAbandonedMay 11, 11Nov 17, 11[H01L]
2011/0215,503 Reducing Adhesion between a Conformable Region and a MoldAbandonedMay 12, 11Sep 08, 11[B29C, C08L, C08K]
8012394 Template pattern density doublingExpiredDec 24, 08Sep 06, 11[B28B]
2011/0193,251 Process Gas Confinement for Nano-ImprintingAbandonedFeb 08, 11Aug 11, 11[B28B]
2011/0189,329 Ultra-Compliant Nanoimprint Lithography TemplateAbandonedJan 31, 11Aug 04, 11[C08J, B82Y, B29C]
2011/0180,127 SOLAR CELL FABRICATION BY NANOIMPRINT LITHOGRAPHYAbandonedJan 28, 11Jul 28, 11[H01L]
2011/0180,964 SYSTEMS AND METHODS FOR SUBSTRATE FORMATIONAbandonedJan 10, 11Jul 28, 11[B29C]
2011/0165,412 ADHESION LAYERS IN NANOIMPRINT LITHOGRAHYAbandonedNov 24, 10Jul 07, 11[B05D, B32B]
2011/0140,304 IMPRINT LITHOGRAPHY TEMPLATEAbandonedDec 09, 10Jun 16, 11[B29C]
2011/0140,306 Composition for an Etching Mask Comprising a Silicon-Containing MaterialAbandonedFeb 17, 11Jun 16, 11[B29C, C08L, C08K]
7935292 Imprinting of partial fields at the edge of the waferExpiredJun 05, 09May 03, 11[B29C]

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