MAPPER LITHOGRAPHY IP B.V.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 10249
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 3968
 
  
 
B82Y SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE  OR TREATMENT OF NANO-STRUCTURES3821
 
  
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 3167
 
  
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 2423
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 11351
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS792
 
  
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 6153
 
  
 
G06F ELECTRIC DIGITAL DATA PROCESSING 6441
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 4201

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0068,047 METHOD AND SYSTEM FOR FABRICATING UNIQUE CHIPS USING A CHARGED PARTICLE MULTI-BEAMLET LITHOGRAPHY SYSTEMDec 23, 16Mar 08, 18[G06F]
2018/0069,710 SECURE CHIPS WITH SERIAL NUMBERSFeb 28, 17Mar 08, 18[H04L, H01L, G06K]
2017/0277,043 LITHOGRAPHY SYSTEM WITH DIFFERENTIAL INTERFEROMETER MODULEJun 12, 17Sep 28, 17[G01B, G03F]
2016/0066,478 Cabinet for Electronic EquipmentApr 08, 14Mar 03, 16[H05K]
2015/0052,776 Drying apparatus for use in a lithography systemAug 20, 14Feb 26, 15[H01J, F26B, G03F]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9922801 Drying apparatus for use in a lithography systemAug 20, 14Mar 20, 18[H01J, H01L, F26B]
9905322 Multi-electrode electron opticsNov 14, 14Feb 27, 18[H01J, G21K]
9887707 Method and device for generating a decoded and synchronized outputJun 30, 16Feb 06, 18[H04L, H03M]
9829804 Substrate holding device, method for manufacturing such a device, and use of such a device in a lithography systemJul 28, 16Nov 28, 17[H01L, G03B, G03F]
9760028 Lithography system and method for processing a target, such as a waferMar 08, 13Sep 12, 17[H01J, B82Y, G03B, G03F]
9703213 Substrate processing apparatusSep 12, 12Jul 11, 17[H01J, B82Y, G03B, G03F]
9690215 Interferometer moduleMay 19, 15Jun 27, 17[G01B, G03F]
9691589 Dual pass scanningNov 10, 11Jun 27, 17[H01J, B82Y, G03F]
RE46452 Electrostatic lens structureJun 12, 14Jun 27, 17[H01J, B23P, B82Y, G03B]
9678443 Lithography system with differential interferometer moduleMar 30, 12Jun 13, 17[G03B, G01B, G03F]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2018/0033,586 APPARATUS AND METHOD FOR PROCESSING OR IMAGING A SAMPLEAbandonedJul 28, 16Feb 01, 18[H01J]
2015/0206,740 ELECTRICAL CHARGE REGULATION FOR A SEMICONDUCTOR SUBSTRATE DURING CHARGED PARTICLE BEAM PROCESSINGAbandonedJan 22, 15Jul 23, 15[H01J, H01L]
2014/0252,953 PLASMA GENERATORAbandonedSep 28, 12Sep 11, 14[H01J]
2013/0120,724 Method for splitting a pattern for use in a multi-beamlet lithography apparatusAbandonedMay 18, 12May 16, 13[G06F, G03B]
8366423 Method and arrangement for realizing a vacuum in a vacuum chamberExpiredFeb 22, 10Feb 05, 13[C23C, F04B]
2012/0069,317 LITHOGRAPHY SYSTEM ARRANGED ON A FOUNDATION, AND METHOD FOR ARRANGING A LITHOGRAPHY SYSTEM ON SAID FOUNDATIONAbandonedSep 20, 11Mar 22, 12[G03B]
2011/0261,344 EXPOSURE METHODAbandonedDec 23, 10Oct 27, 11[G03B, B01J, G01B]
7988136 Stage device for a vacuum chamberExpiredApr 02, 03Aug 02, 11[B25B]
2011/0174,985 LITHOGRAPHY SYSTEM WITH LENS ROTATIONAbandonedJan 20, 11Jul 21, 11[H01J]
2011/0049,393 Lithography Machine and Substrate Handling ArrangementAbandonedFeb 22, 10Mar 03, 11[G21G]
2011/0042,579 CHARGED PARTICLE LITHOGRAPHY APPARATUS AND METHOD OF GENERATING VACUUM IN A VACUUM CHAMBERAbandonedFeb 19, 10Feb 24, 11[H01J]
2009/0261,267 PROJECTION LENS ARRANGEMENTAbandonedFeb 26, 09Oct 22, 09[H01J]
7215070 System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emissionExpiredFeb 13, 04May 08, 07[H01J]
7019312 Adjustment in a MAPPER systemExpiredJun 20, 03Mar 28, 06[G21G]
6919952 Direct write lithography systemExpiredMar 19, 03Jul 19, 05[G03B]
6844560 Lithography system comprising a converter plate and means for protecting the converter plateExpiredAug 13, 02Jan 18, 05[H01J]
2003/0178,583 Field emission photo-cathode array for lithography system and lithography system provided with such an arrayAbandonedMar 18, 03Sep 25, 03[G21G, H01L, G21K, G03F]
6335783 Lithography systemExpiredJan 07, 00Jan 01, 02[G03B, A61N]

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