LAYTEC AG

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS495
 
  
 
C30B SINGLE-CRYSTAL GROWTH 155
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 177
 
  
 
G01K MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR 145

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8810798 Method and apparatus for real-time determination of spherical and non-spherical curvature of a surfaceJul 09, 12Aug 19, 14[H01L, G01B]
8514408 Method and apparatus for real-time determination of curvature and azimuthal asymmetry of a surfaceSep 15, 10Aug 20, 13[G01B]
8496375 Pyrometer adapted for detecting UV-radiation and use thereofAug 18, 10Jul 30, 13[G01J]
8388219 Method for calibrating a pyrometer, method for determining the temperature of a semiconducting wafer and system for determining the temperature of a semiconducting waferMay 11, 10Mar 05, 13[G01K]
7505150 Device and method for the measurement of the curvature of a surfaceMay 12, 06Mar 17, 09[G01B]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2014/0038,315 APPARATUS AND METHOD FOR MEASURING THE DIMENSIONS OF 1-DIMENSIONAL AND 0-DIMENSIONAL NANOSTRUCTURES IN REAL-TIME DURING EPITAXIAL GROWTHAbandonedAug 02, 13Feb 06, 14[G01B, C30B]
2013/0294,476 FLAT LIGHT EMITTING PLATE FOR SIMULATING THERMAL RADIATION, METHOD FOR CALIBRATING A PYROMETER AND METHOD FOR DETERMINING THE TEMPERATURE OF A SEMICONDUCTING WAFERAbandonedMay 02, 13Nov 07, 13[G01J, H05B]
8233158 Method and apparatus for determining the layer thickness and the refractive index of a sampleExpiredMay 11, 10Jul 31, 12[G01B]
7283218 Method and apparatus for the determination of characteristic layer parameters at high temperaturesExpiredDec 12, 03Oct 16, 07[G01J]

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