LAM RESEARCH CORPORATION

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology MATTERS Rank in Class
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 1156 38
 
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 513 3
 
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 339 11
 
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 228 2
 
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 210 3
 
 
H05H PLASMA TECHNIQUE 102 3
 
 
B44C PRODUCING DECORATIVE EFFECTS 74 3
 
 
G06F ELECTRIC DIGITAL DATA PROCESSING 70 372
 
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 59 103
 
 
C25D PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING 53 11
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Top Patents (by citation)

Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0033,622 DOPED ALD FILMS FOR SEMICONDUCTOR PATTERNING APPLICATIONS Sep 28, 16 Feb 01, 18 [H01L]
2018/0033,672 SUBSTRATE SUPPORT WITH INCREASING AREAL DENSITY AND CORRESPONDING METHOD OF FABRICATING Jul 27, 16 Feb 01, 18 [C23C, H01J, H01L]
2018/0025,891 SYSTEMS AND METHODS FOR ACHIEVING A PRE-DETERMINED FACTOR ASSOCIATED WITH AN EDGE REGION WITHIN A PLASMA CHAMBER BY SYNCHRONIZING MAIN AND EDGE RF GENERATORS Jun 28, 17 Jan 25, 18 [H01J, H01L]
2018/0025,930 CONTROL OF WAFER BOW IN MULTIPLE STATIONS Jun 30, 17 Jan 25, 18 [H01J, H01L]
2018/0012,733 COLLAR, CONICAL SHOWERHEADS AND/OR TOP PLATES FOR REDUCING RECIRCULATION IN A SUBSTRATE PROCESSING SYSTEM Jul 11, 16 Jan 11, 18 [C23C, H01J]
2018/0012,785 ELECTROSTATIC CHUCK WITH FEATURES FOR PREVENTING ELECTRICAL ARCING AND LIGHT-UP AND IMPROVING PROCESS UNIFORMITY Jun 27, 17 Jan 11, 18 [H01L]
2018/0005,802 SYSTEMS AND METHODS FOR TAILORING ION ENERGY DISTRIBUTION FUNCTION BY ODD HARMONIC MIXING Jul 01, 16 Jan 04, 18 [H01J]
2018/0005,814 SELECTIVE ATOMIC LAYER DEPOSITION WITH POST-DOSE TREATMENT Jul 01, 16 Jan 04, 18 [C23C, H01J, H01L]
2018/0005,819 SUBSTRATE PROCESSING METHOD FOR DEPOSITING A BARRIER LAYER TO PREVENT PHOTORESIST POISONING Jun 21, 17 Jan 04, 18 [C07F, H01L]
2018/0005,839 ENVIRONMENTALLY GREEN PROCESS AND COMPOSITION FOR COBALT WET ETCH Jun 29, 16 Jan 04, 18 [H01L]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9879795 Additively manufactured gas distribution manifold Jan 15, 16 Jan 30, 18 [F16K, C23C, H01J, F17D, B33Y]
9881772 Multi-radiofrequency impedance control for plasma uniformity tuning Mar 28, 12 Jan 30, 18 [C23F, C23C, H01J, H01L]
9881788 Back side deposition apparatus and applications May 22, 14 Jan 30, 18 [C23C, H01J, H01L]
9881820 Front opening ring pod Apr 25, 16 Jan 30, 18 [H01L]
9881826 Buffer station with single exit-flow direction Oct 24, 14 Jan 30, 18 [H01L]
9873940 Coating system and method for coating interior fluid wetted surfaces of a component of a semiconductor substrate processing apparatus Dec 16, 14 Jan 23, 18 [C23C]
9875883 Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching Jul 26, 17 Jan 23, 18 [C23C, H01J, H01L]
9875890 Deposition of metal dielectric film for hardmasks Mar 24, 15 Jan 23, 18 [C23C, H01J, H01L]
9875891 Selective inhibition in atomic layer deposition of silicon-containing films Jan 05, 17 Jan 23, 18 [C23C, H01L]
9875968 Interlevel conductor pre-fill utilizing selective barrier deposition Feb 24, 17 Jan 23, 18 [H01L]
9869392 Edge seal for lower electrode assembly Jun 20, 12 Jan 16, 18 [H01J, H02N, F16J, H01L]
9870547 System and method of demand and capacity management Jan 19, 09 Jan 16, 18 [G06Q, G06F, G06G]
9870899 Cobalt etch back Jun 24, 15 Jan 16, 18 [H01J, H01L]
9870917 Variable temperature hardware and methods for reduction of wafer backside deposition Feb 24, 16 Jan 16, 18 [C23F, C23C, H01J, H01L]
9870932 Pressure purge etch method for etching complex 3-D structures Jul 27, 16 Jan 16, 18 [H01J, H01L]
9871759 Social network service for semiconductor manufacturing equipment and users Sep 11, 15 Jan 16, 18 [H04L, G21C, G06F, H01L, G01M]
9863041 Internally heated porous filter for defect reduction with liquid or solid precursors Oct 07, 15 Jan 09, 18 [C23C, H01J, B01D]
9864361 Flexible temperature compensation systems and methods for substrate processing systems Sep 23, 15 Jan 09, 18 [G05B]
9865455 Nitride film formed by plasma-enhanced and thermal atomic layer deposition process Sep 07, 16 Jan 09, 18 [C23C, H01L]
9865472 Fabrication of a silicon structure and deep silicon etch with profile control Apr 20, 16 Jan 09, 18 [H01J, H01L]
9865501 Method and apparatus for remote plasma treatment for reducing metal oxides on a metal seed layer Nov 21, 13 Jan 09, 18 [C23C, H01J, H01L, C25D]
9865815 Bromine containing silicon precursors for encapsulation layers Sep 21, 16 Jan 09, 18 [H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0355,939 POLARIZATION STABILIZER ADDITIVE FOR ELECTROPLATING ABAN Jun 05, 15 Dec 08, 16 [C25D]
2016/0329,206 METHODS OF MODULATING RESIDUAL STRESS IN THIN FILMS ABAN May 08, 15 Nov 10, 16 [H01L]
2016/0270,237 Copper Interconnect Device Including Surface Functionalized Graphene Capping Layer and Fabrication Method Thereof ABAN Mar 07, 16 Sep 15, 16 [H05K]
2016/0233,114 CHAMBERS FOR PARTICLE REDUCTION IN SUBSTRATE PROCESSING SYSTEMS ABAN Feb 05, 15 Aug 11, 16 [C23C, H01L]
2016/0181,116 SELECTIVE NITRIDE ETCH ABAN Dec 18, 14 Jun 23, 16 [C09K, H01L]
2016/0148,813 GAS INJECTION METHOD FOR UNIFORMLY PROCESSING A SEMICONDUCTOR SUBSTRATE IN A SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS ABAN Nov 25, 14 May 26, 16 [H01L]
2016/0138,160 REACTIVE ULTRAVIOLET THERMAL PROCESSING OF LOW DIELECTRIC CONSTANT MATERIALS ABAN Nov 18, 14 May 19, 16 [C23C]
2016/0111,342 METHOD AND APPARATUS FOR CHARACTERIZING METAL OXIDE REDUCTION ABAN Oct 15, 15 Apr 21, 16 [C23C, H01J, H01L, G01N]
2016/0079,100 VACUUM CARRIER INTERFACE HAVING A SWITCHABLE REDUCED CAPACITY AIRLOCK CHAMBER ABAN Sep 17, 14 Mar 17, 16 [C23C, H01L, B25J]
2016/0042,943 LOW-K DIELECTRIC FILM FORMATION ABAN Sep 05, 14 Feb 11, 16 [H01J, H01L]
2016/0042,945 COVERAGE OF HIGH ASPECT RATIO FEATURES USING SPIN-ON DIELECTRIC THROUGH A WETTED SURFACE WITHOUT A PRIOR DRYING STEP ABAN Aug 11, 14 Feb 11, 16 [H01L]
2015/0376,792 ATMOSPHERIC PLASMA APPARATUS FOR SEMICONDUCTOR PROCESSING ABAN Jun 30, 14 Dec 31, 15 [C23C, H01L, C25D]
2015/0380,278 HARDWARE FOR THE SEPARATION AND DEGASSING OF DISSOLVED GASES IN SEMICONDUCTOR PRECURSOR CHEMICALS ABAN Jun 30, 14 Dec 31, 15 [H01L, B01D]
2015/0380,296 CLEANING OF CARBON-BASED CONTAMINANTS IN METAL INTERCONNECTS FOR INTERCONNECT CAPPING APPLICATIONS ABAN Jun 25, 14 Dec 31, 15 [C23C, H01L]
2015/0364,300 DETERMINING PRESENCE OF CONDUCTIVE FILM ON DIELECTRIC SURFACE OF REACTION CHAMBER ABAN Jun 16, 14 Dec 17, 15 [C23C, H01J]
2015/0364,322 SILICON CONTAINING CONFINEMENT RING FOR PLASMA PROCESSING APPARATUS AND METHOD OF FORMING THEREOF ABAN Aug 06, 15 Dec 17, 15 [C23C, H01L]
2015/0307,994 ELECTROLESS DEPOSITION OF CONTINUOUS NICKEL LAYER USING COMPLEXED Ti3+ METAL IONS AS REDUCING AGENTS ABAN Apr 29, 14 Oct 29, 15 [C23C]
2015/0299,882 NICKEL ELECTROPLATING SYSTEMS HAVING A GRAIN REFINER RELEASING DEVICE ABAN Apr 18, 14 Oct 22, 15 [H01L, C25D]
2015/0299,886 METHOD AND APPARATUS FOR PREPARING A SUBSTRATE WITH A SEMI-NOBLE METAL LAYER ABAN Apr 18, 14 Oct 22, 15 [H01L, C25D]
2015/0247,238 RF CYCLE PURGING TO REDUCE SURFACE ROUGHNESS IN METAL OXIDE AND METAL NITRIDE FILMS ABAN Mar 03, 14 Sep 03, 15 [C23C, H01L]

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