Kaufman & Robinson, Inc.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 9119
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 398
 
  
 
H05B ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR 3108
 
  
 
F03H PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR 29
 
  
 
F02K JET-PROPULSION PLANTS 137
 
  
 
G01K MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR 145
 
  
 
H02M APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF 1101
 
  
 
H05H PLASMA TECHNIQUE 129

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8994258 End-hall ion source with enhanced radiation coolingSep 25, 13Mar 31, 15[H01J]
8698401 Mitigation of plasma-inductor terminationOct 13, 10Apr 15, 14[H05B]
7843138 Power supply for a hot-filament cathodeJun 11, 08Nov 30, 10[H05B]
7728498 Industrial hollow cathodeDec 16, 06Jun 01, 10[H01J]
7667379 Industrial hollow cathode with radiation shield structureJan 25, 06Feb 23, 10[F03H]
6911789 Power supply for a hot-filament cathodeMar 04, 03Jun 28, 05[H02M, H05B]
6870164 Pulsed operation of hall-current ion sourcesOct 12, 00Mar 22, 05[H01J]
6864485 Ion optics with shallow dished gridsDec 04, 01Mar 08, 05[H01J, G01K]
6843891 Apparatus for sputter depositionJan 19, 01Jan 18, 05[C23C]
6750600 Hall-current ion sourceMay 03, 01Jun 15, 04[H01J]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2004/0000,853 Industrial hollow cathodeAbandonedJun 17, 03Jan 01, 04[H01J]
2001/0045,352 Sputter deposition using multiple targetsAbandonedJun 13, 01Nov 29, 01[C23C]
6323586 Closed drift hollow cathodeExpiredMar 08, 99Nov 27, 01[H01J]
6238537 Ion assisted deposition sourceExpiredApr 13, 00May 29, 01[C23C]
5793195 Angular distribution probeExpiredAug 30, 95Aug 11, 98[G01N]
5154635 Coaxial vacuum cableExpiredDec 04, 91Oct 13, 92[H01R]
5136211 Capacitively coupled radiofrequency plasma sourceWithdrawnJan 28, 92Aug 04, 92[H05H]
4862032 End-Hall ion sourceExpiredOct 20, 86Aug 29, 89[F03H]
4684848 Broad-beam electron sourceExpiredOct 15, 85Aug 04, 87[H01J, H05B]

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