KLA-TENCOR TECHNOLOGIES CORPORATION

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 22349
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS9024
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 6865
 
  
 
G06F ELECTRIC DIGITAL DATA PROCESSING 59388
 
  
 
G06K RECOGNITION OF DATA; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS 58140
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 43319
 
  
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 39120
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 3643
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 27178
 
  
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 1829

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2015/0178,914 Methods and Systems for Inspection of Wafers and Reticles Using Designer Intent DataMar 04, 15Jun 25, 15[G06T]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9401014 Methods and systems for utilizing design data in combination with inspection dataDec 19, 14Jul 26, 16[G06T, G06F, G03F, G06K]
9188974 Methods for improved monitor and control of lithography processesJul 17, 11Nov 17, 15[G06Q, G05B, G06F]
9068917 Systems and methods for inspection of a specimenMar 14, 06Jun 30, 15[G01N]
9068952 Method and apparatus for producing and measuring dynamically focussed, steered, and shaped oblique laser illumination for spinning wafer inspection systemSep 02, 09Jun 30, 15[G01N, G02B]
9052494 Optical imaging system with catoptric objective; broadband objective with mirror; and refractive lenses and broadband optical imaging system having two or more imaging pathsMar 30, 10Jun 09, 15[G01N, G02B, G03F]
9053833 DC high-voltage super-radiant free-electron based EUV sourceFeb 27, 13Jun 09, 15[H01J, G21K]
9037280 Computer-implemented methods for performing one or more defect-related functionsJun 06, 05May 19, 15[G05B, G06F]
9002497 Methods and systems for inspection of wafers and reticles using designer intent dataJul 01, 04Apr 07, 15[G01N, G06F, G03F]
8923600 Methods and systems for utilizing design data in combination with inspection dataAug 03, 09Dec 30, 14[G06F, G03F, G06K]
8924014 Dual scanning stageSep 14, 12Dec 30, 14[H01L, G01N, G05B, B25J]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2014/0291,516 Methods and Systems for Measuring a Characteristic of a Substrate or Preparing a Substrate for AnalysisAbandonedJun 11, 14Oct 02, 14[H01J]
2013/0314,710 Methods and Systems for Determining a Critical Dimension and Overlay of a SpecimenAbandonedAug 05, 13Nov 28, 13[G01N]
2011/0304,527 COMPUTER-IMPLEMENTED METHODS, CARRIER MEDIA, AND SYSTEMS FOR DISPLAYING AN IMAGE OF AT LEAST A PORTION OF A WAFERAbandonedSep 14, 07Dec 15, 11[G09G]
8052885 Structural modification using electron beam activated chemical etchExpiredJan 12, 07Nov 08, 11[C03C, H01L, C23F, B44C]
2010/0119,144 METHODS AND SYSTEMS FOR UTILIZING DESIGN DATA IN COMBINATION WITH INSPECTION DATAAbandonedJan 22, 10May 13, 10[G06K]
7684145 Method and system for perpendicular magnetic media metrologyExpiredMar 28, 07Mar 23, 10[G11B]
7659126 Electrical test method and apparatusExpiredJan 22, 07Feb 09, 10[H01L]
7649365 Inline inspection of photovoltaics for electrical defectsExpiredMar 24, 07Jan 19, 10[G01R]
7630086 Surface finish roughness measurementExpiredJan 16, 07Dec 08, 09[G01B]
2009/0290,784 METHODS AND SYSTEMS FOR BINNING DEFECTS DETECTED ON A SPECIMENAbandonedAug 03, 09Nov 26, 09[G06K]
7612348 Transverse magnetic field voltage isolatorExpiredMay 22, 08Nov 03, 09[H01J, H01F]
7608468 Apparatus and methods for determining overlay and uses of sameExpiredSep 23, 04Oct 27, 09[H01L, G01R, G01B, G01D]
7606677 Dynamic measurement controlExpiredNov 10, 04Oct 20, 09[G06F]
7604449 Equipment front end moduleExpiredJun 27, 05Oct 20, 09[H01L]
7604906 Films for prevention of crystal growth on fused silica substrates for semiconductor lithographyExpiredSep 21, 05Oct 20, 09[G03F]
7573046 Thermal field emission electron gun with reduced arcingExpiredMar 26, 07Aug 11, 09[H01J]
2009/0190,141 SYSTEM FOR MEASURING A SAMPLE WITH A LAYER CONTAINING A PERIODIC DIFFRACTING STRUCTUREAbandonedApr 06, 09Jul 30, 09[G01B]
7566517 Feature printability optimization by optical toolExpiredNov 09, 05Jul 28, 09[G03F]
7561282 Techniques for determining overlay and critical dimension using a single metrology toolExpiredOct 25, 06Jul 14, 09[G01B]
7557921 Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic toolsExpiredOct 12, 05Jul 07, 09[G03C, G01B, G06K]

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