KANAGAWA UNIVERSITY

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G06K RECOGNITION OF DATA; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS 6192
 
  
 
C07C ACYCLIC OR CARBOCYCLIC COMPOUNDS 5133
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 4100
 
  
 
C07F ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM, OR TELLURIUM 367
 
  
 
C08G MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS 3117
 
  
 
B01J CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS 2107
 
  
 
C01G COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F 237
 
  
 
C08F MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS 2123
 
  
 
C08J WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER- TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C C08F, C08G or C08H 276
 
  
 
C08L COMPOSITIONS OF MACROMOLECULAR COMPOUNDS 2114

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0275,179 METHOD FOR PRODUCING CHIRAL METAL OXIDE STRUCTURE, AND CHIRAL POROUS STRUCTUREJun 13, 17Sep 28, 17[B01J, C01G]
2016/0152,642 FLOURINE-CONTAINING COMPOUND, SUBSTRATE FOR PATTERNING, PHOTODEGRADABLE COUPLING AGENT, PATTERNING METHOD, AND COMPOUNDFeb 02, 16Jun 02, 16[C07F, C07D, G03F]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9701545 Method for producing chiral metal oxide structure, and chiral porous structureOct 29, 12Jul 11, 17[B01J, C01G]
9637559 Emulsifier and production method therefor, and production method for emulsionAug 31, 11May 02, 17[C08B, B01F]
9606437 Fluorine-containing compound, substrate for pattern formation, photodegradable coupling agent, pattern formation method, and compoundMar 02, 15Mar 28, 17[H01L, C07F, C07C, G03F]
9506001 Emulsification dispersants, a method for emulsification and dispersion using the emulsification dispersants, emulsions, and emulsion fuelsMar 29, 05Nov 29, 16[C10L, B01F]
9400128 Temperature control device and temperature elementMay 08, 12Jul 26, 16[B01L, F25B]
9379405 Polymer electrolyte membrane having alkylether graft chainJun 21, 13Jun 28, 16[C08J, H01M]
9051246 Compound having trimethylene structure, polymer compound containing unit that has trimethylene structure, and reactive compound having trimethylene structureJan 28, 11Jun 09, 15[C08G, C07F, C07C]
8941092 Method for forming semiconductor device structure and semiconductor deviceMar 05, 12Jan 27, 15[H01L]
8768054 Image processing device, image processing method, and computer-readable storage medium storing image processing programDec 22, 09Jul 01, 14[G06K]
8603369 Positive electrode material for electrical device, and electrical device produced using sameDec 02, 10Dec 10, 13[H01M, H01B]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2017/0158,606 FLUORINE-CONTAINING COMPOUND, SUBSTRATE FOR PATTERN FORMATION, PHOTODEGRADABLE COUPLING AGENT, PATTERN FORMATION METHOD, AND COMPOUNDAbandonedFeb 15, 17Jun 08, 17[C07C]
2015/0017,306 EMULSIFIED DISPERSANT AND EMULSIFIED COMPOSITIONAbandonedSep 26, 14Jan 15, 15[A23L]
2013/0164,433 PROCESS FOR PRODUCING EMULSIFIER-PRODUCING MATERIAL, PROCESS FOR PRODUCING EMULSIFIER, EMULSIFIER FOR ORALLY ADMINISTERED COMPOSITION, AND ORALLY ADMINISTERED COMPOSITIONAbandonedDec 21, 12Jun 27, 13[A23L]
2009/0324,658 Cosmetic and Method for Production ThereofAbandonedJun 26, 07Dec 31, 09[A61K, A61Q]
2008/0031,906 Cosmetic Composition and Method for Producing the SameAbandonedSep 02, 05Feb 07, 08[A61K, A61Q]
7208568 Resin curable with actinic radiation, process for the production thereof, and photocurable and thermosetting resin compositionExpiredDec 14, 04Apr 24, 07[C08G]
7132168 Resin curable with actinic radiation, process for the production thereof, and photocurable and thermosetting resin compositionExpiredDec 14, 04Nov 07, 06[B32B]
6906116 Unsaturated polyester compounds, resins curable with actinic energy ray, processes for the production thereof, and curable compositionsExpiredAug 14, 03Jun 14, 05[C09D, C08L]
2004/0067,312 Method for forming thin film and catalyzed treatment solution used thereforAbandonedOct 01, 03Apr 08, 04[C23C, B05D]

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