JORDAN VALLEY SEMICONDUCTORS LTD.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 53153
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 870
 
  
 
G01T MEASUREMENT OF NUCLEAR OR X-RADIATION 844
 
  
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 838
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS594
 
  
 
G12B DETAILS OF INSTRUMENTS, OR COMPARABLE DETAILS OF OTHER APPARATUS, NOT OTHERWISE PROVIDED FOR34
 
  
 
H05G X-RAY TECHNIQUE 238
 
  
 
A61B DIAGNOSIS; SURGERY; IDENTIFICATION 1239
 
  
 
G01D MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED BY A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR 159
 
  
 
G02F DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS 1132

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9269468 X-ray beam conditioningApr 29, 13Feb 23, 16[G21K, G01N]
8867041 Optical vacuum ultra-violet wavelength nanoimprint metrologyJan 15, 12Oct 21, 14[G01N, G03F]
8781070 Detection of wafer-edge defectsAug 09, 12Jul 15, 14[G01N]
8731138 High-resolution X-ray diffraction measurement with enhanced sensitivityJul 12, 12May 20, 14[G01N]
8693635 X-ray detector assembly with shieldJun 09, 13Apr 08, 14[G01T]
8687766 Enhancing accuracy of fast high-resolution X-ray diffractometryJul 12, 11Apr 01, 14[G01N, G01T]
8564780 Method and system for using reflectometry below deep ultra-violet (DUV) wavelengths for measuring properties of diffracting or scattering structures on substrate work piecesJul 28, 10Oct 22, 13[G01N]
8565379 Combining X-ray and VUV analysis of thin film layersMar 14, 12Oct 22, 13[G01N]
8437450 Fast measurement of X-ray diffraction from tilted layersDec 02, 10May 07, 13[G01N]
8243878 High-resolution X-ray diffraction measurement with enhanced sensitivityJan 07, 10Aug 14, 12[G01N]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2012/0170,021 Method and apparatus for providing multiple wavelength reflectance magnitude and phase for a sampleAbandonedSep 01, 09Jul 05, 12[G01N]
2010/0277,741 COMBINED OPTICAL METROLOGY TECHNIQUESAbandonedJul 13, 10Nov 04, 10[G01N]
2009/0219,537 Method and apparatus for using multiple relative reflectance measurements to determine properties of a sample using vacuum ultra violet wavelengthsAbandonedFeb 28, 08Sep 03, 09[G01N]
2009/0002,711 Broad band referencing reflectometerAbandonedSep 02, 08Jan 01, 09[G01N]
2008/0246,951 Method and system for using reflectometry below deep ultra-violet (DUV) wavelengths for measuring properties of diffracting or scattering structures on substrate work-piecesAbandonedApr 07, 08Oct 09, 08[G01J]
2008/0129,986 Method and apparatus for optically measuring periodic structures using orthogonal azimuthal sample orientationsAbandonedNov 29, 07Jun 05, 08[G01J, G01B]
2008/0049,895 Accurate measurement of layer dimensions using XRFAbandonedAug 10, 07Feb 28, 08[G01N]
2007/0274,447 Automated selection of X-ray reflectometry measurement locationsAbandonedMay 15, 07Nov 29, 07[G01N]

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