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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2009/0090,384 CLEANING METHOD OF APPARATUS FOR DEPOSITING METAL CONTAINING FILMAbandonedJan 22, 07Apr 09, 09[C25F]
2007/0151,517 HEATER FOR DEPOSITING THIN FILMAbandonedNov 29, 06Jul 05, 07[C23C]
2007/0026,144 Method of depositing thin film on waferAbandonedAug 28, 04Feb 01, 07[C23C]
2006/0210,712 Method of depositing thin film on substrate using impulse ALD processAbandonedMar 16, 06Sep 21, 06[C23C]
2006/0201,428 Shower head and method of fabricating the sameAbandonedMay 18, 06Sep 14, 06[C23C, C23F]
2006/0096,534 Apparatus for depositing thin film on waferAbandonedNov 02, 05May 11, 06[C23C]
2005/0223,982 Apparatus and method for depositing thin film on wafer using remote plasmaAbandonedOct 19, 04Oct 13, 05[C23C]
2005/0003,088 Method of depositing thin film on waferAbandonedJun 30, 04Jan 06, 05[C23C]
2004/0187,779 Thin film deposition reactorAbandonedMar 12, 04Sep 30, 04[C23C]
2004/0191,413 Reactor for thin film deposition and method for depositing thin film on wafer using the reactorAbandonedMay 10, 04Sep 30, 04[C23C]
2004/0180,553 Method of depositing ALD thin films on waferAbandonedMar 10, 04Sep 16, 04[H01L]
2004/0149,212 Reaction chamber for depositing thin filmAbandonedDec 30, 03Aug 05, 04[C23C]
2004/0101,622 Method of depositing thin film using aluminum oxideAbandonedNov 19, 03May 27, 04[C23C, H01L]
6231672 Apparatus for depositing thin films on semiconductor wafer by continuous gas injectionExpiredMay 18, 99May 15, 01[C23C]

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