IMS NANOFABRICATION AG

Patent Owner

Watch Compare Add to Portfolio

Stats

Details

Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 22106
 
  
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 1036
 
  
 
G06F ELECTRIC DIGITAL DATA PROCESSING 3444
 
  
 
A61N ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY 2105
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 2102
 
  
 
G21G CONVERSION OF CHEMICAL ELEMENTS; RADIOACTIVE SOURCES 215
 
  
 
G01K MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR 145
 
  
 
G01T MEASUREMENT OF NUCLEAR OR X-RADIATION 151
 
  
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 196
 
  
 
G05B CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS 1100

Top Patents (by citation)

Upgrade to the Professional Level to View Top Patents for this Owner. Learn More

Recent Publications

  • No Recent Publications to Display

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9799487 Bi-directional double-pass multi-beam writingMar 18, 16Oct 24, 17[H01J, G21K]
9653263 Multi-beam writing of pattern areas of relaxed critical dimensionMar 17, 16May 16, 17[H01J, G03B]
9568907 Correction of short-range dislocations in a multi-beam writerSep 03, 15Feb 14, 17[H01J, G21K, G05B]
9520268 Compensation of imaging deviations in a particle-beam writer using a convolution kernelJul 09, 15Dec 13, 16[H01J, G21K, G06F]
9495499 Compensation of dose inhomogeneity using overlapping exposure spotsMay 29, 15Nov 15, 16[H01J, G06F]
9443699 Multi-beam tool for cutting patternsApr 23, 15Sep 13, 16[H01J]
9373482 Customizing a particle-beam writer using a convolution kernelJul 09, 15Jun 21, 16[H01J, G06F]
9269543 Compensation of defective beamlets in a charged-particle multi-beam exposure toolFeb 25, 15Feb 23, 16[H01J, G21K]
9099277 Pattern definition device having multiple blanking arraysJul 17, 14Aug 04, 15[H01J]
9093201 High-voltage insulation device for charged-particle optical apparatusJan 15, 14Jul 28, 15[H01J, B82Y, H01B]

View all patents..

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
9443052 Compensation of dose inhomogeneity using overlapping exposure spotsWithdrawnMay 29, 15Sep 13, 16[H01J, G06F]
2015/0311,031 Multi-Beam Tool for Cutting PatternsAbandonedApr 23, 15Oct 29, 15[H01J]
2015/0069,260 CHARGED-PARTICLE MULTI-BEAM APPARATUS HAVING CORRECTION PLATEAbandonedSep 03, 14Mar 12, 15[H01J]
4924104 Ion beam apparatus and method of modifying substrateExpiredSep 09, 88May 08, 90[H01J]

Top Inventors for This Owner

Upgrade to the Professional Level to View Top Inventors for this Owner. Learn More

We are sorry but your current selection exceeds the maximum number of comparisons () for this membership level. Upgrade to our Level for up to -1 comparisons!

We are sorry but your current selection exceeds the maximum number of portfolios (0) for this membership level. Upgrade to our Level for up to -1 portfolios!.