IMS-IONEN MIKROFABRIKATIONS SYSTEME GMBH

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Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 2102
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 1361

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
6835508 Large-area membrane mask and method for fabricating the maskAug 08, 02Dec 28, 04[G03F]
6773854 Method of producing a perforated mask for particle radiationJul 31, 02Aug 10, 04[G03F]
6696371 Method for fabricating positionally exact surface-wide membrane masksJun 05, 02Feb 24, 04[H01L]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
7033647 Method of synthesising carbon nano tubesExpiredNov 20, 02Apr 25, 06[C23C]
2003/0122,085 Field ionization ion sourceAbandonedDec 27, 01Jul 03, 03[H01J]
2002/0148,976 Thermal control of image pattern distortionsAbandonedMar 14, 02Oct 17, 02[G21G]
6419752 Structuring device for processing a substrateExpiredSep 17, 99Jul 16, 02[C23C]
2001/0036,588 Lithographic imaging of a structure pattern onto one or more fields on a substrateAbandonedFeb 02, 01Nov 01, 01[G03C]
6296700 Method of producing a structured layerExpiredSep 01, 99Oct 02, 01[C30B]
6194730 Electrostatic lensExpiredNov 05, 98Feb 27, 01[H01J]
6156217 Method for the purpose of producing a stencil maskExpiredApr 30, 99Dec 05, 00[H01L, C03C, C23F, B44C, C25F]
6136160 Process for producing a carbon film on a substrateExpiredJul 08, 99Oct 24, 00[C23C]
5876880 Process for producing a structured maskExpiredNov 25, 97Mar 02, 99[G03F]
5693950 Projection system for charged particlesExpiredSep 03, 96Dec 02, 97[H01J, H01L]
5672449 Silicon membrane and method of making sameExpiredAug 15, 95Sep 30, 97[G03F]
5436460 Ion-optical imaging systemExpiredApr 26, 93Jul 25, 95[H01J]
5378917 Particle-beam imaging systemExpiredMar 30, 93Jan 03, 95[H01J]
5350924 Ion-optical imaging systemExpiredJul 10, 92Sep 27, 94[H01J]
5317161 Ion sourceExpiredMay 21, 92May 31, 94[H01J]
5110373 Silicon membrane with controlled stressExpiredAug 09, 90May 05, 92[H01L]
4985634 Ion beam lithographyExpiredJul 29, 88Jan 15, 91[H01J]
4966663 Method for forming a silicon membrane with controlled stressExpiredSep 13, 88Oct 30, 90[C25F]
4919749 Method for making high resolution silicon shadow masksExpiredMay 26, 89Apr 24, 90[H01L, C03C, B44C]

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