Heraeus, Inc.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 596
 
  
 
B22F WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER 448
 
  
 
H01F MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES 381
 
  
 
B32B LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM2155
 
  
 
C22C ALLOYS 270
 
  
 
B23K SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 192
 
  
 
C04B LIME; MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS 167
 
  
 
C22F CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS OR NON-FERROUS ALLOYS 136

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8118906 Methodology for recycling Ru and Ru-alloy deposition targets and targets made of recycled Ru and Ru-based alloy powdersOct 29, 07Feb 21, 12[B22F]
7397013 Plasma lineation electrodeNov 23, 05Jul 08, 08[B23K]
RE40100 Fabrication of B/C/N/O/Si doped sputtering targetsNov 02, 04Feb 26, 08[C23C]
7311874 Sputter target and method for fabricating sputter target including a plurality of materialsDec 19, 03Dec 25, 07[B22F]
7229588 Mechanically alloyed precious metal magnetic sputtering targets fabricated using rapidly solidified alloy powders and elemental Pt metalJan 13, 04Jun 12, 07[B22F]
6949156 Methods for making and using self-constrained low temperature glass-ceramic unfired tape for microelectronicsFeb 13, 04Sep 27, 05[C04B, B32B]
6797137 Mechanically alloyed precious metal magnetic sputtering targets fabricated using rapidly solidfied alloy powders and elemental Pt metalApr 11, 01Sep 28, 04[C23C, H01F]
6759005 Fabrication of B/C/N/O/Si doped sputtering targetsJul 23, 02Jul 06, 04[B22F]
6743534 Self-constrained low temperature glass-ceramic unfired tape for microelectronics and methods for making and using the sameOct 01, 02Jun 01, 04[B32B]
6599377 Wrought processing of brittle target alloy for sputtering applicationsOct 01, 99Jul 29, 03[C22C]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2012/0111,723 METHODOLOGY FOR RECYCLING RU AND RU-ALLOY DEPOSITION TARGETS & TARGETS MADE OF RECYCLED RU AND RU-BASED ALLOY POWDERSAbandonedJan 13, 12May 10, 12[C23C, C22C]
2009/0258,238 SILICIDE FORMATION UTILIZING NI-DOPED COBALT DEPOSITION SOURCEAbandonedApr 14, 08Oct 15, 09[C23C, H01L, B05D, C09D, B32B]
2009/0134,015 ENHANCED OXYGEN NON-STOICHIOMETRY COMPENSATION FOR THIN FILMSAbandonedFeb 04, 09May 28, 09[C23C]
2009/0120,237 ENHANCED FORMULATION OF COBALT ALLOY MATRIX COMPOSITIONSAbandonedJan 12, 09May 14, 09[B01F, C22C]
2009/0053,089 HOMOGENEOUS GRANULATED METAL BASED and METAL-CERAMIC BASED POWDERSAbandonedAug 20, 07Feb 26, 09[B22F, C22C]
7494617 Enhanced formulation of cobalt alloy matrix compositionsExpiredSep 29, 05Feb 24, 09[C22C]
2009/0028,744 Ultra-high purity NiPt alloys and sputtering targets comprising sameAbandonedJul 23, 07Jan 29, 09[C22C, B22C]
2009/0010,792 Brittle metal alloy sputtering targets and method of fabricating sameAbandonedJul 02, 07Jan 08, 09[C23C, B22F]
2008/0268,292 Hexagonal close-packed ceramic seedlayers for perpendicular magnetic recording mediaAbandonedApr 26, 07Oct 30, 08[B05D, G11B]
2008/0238,601 Inductive devices with granular magnetic materialsAbandonedJul 11, 07Oct 02, 08[H01F]
2008/0210,555 HIGH DENSITY CERAMIC AND CERMET SPUTTERING TARGETS BY MICROWAVE SINTERINGAbandonedDec 04, 07Sep 04, 08[C23C, B22F]
2008/0202,916 Controlling magnetic leakage flux in sputtering targets containing magnetic and non-magnetic elementsAbandonedFeb 22, 07Aug 28, 08[C23C]
2008/0173,543 LOW OXYGEN CONTENT, CRACK-FREE HEUSLER AND HEUSLER-LIKE ALLOYS & DEPOSITION SOURCES & METHODS OF MAKING SAMEAbandonedJan 17, 08Jul 24, 08[C22B, C23C, B22D, C22C]
2008/0170,959 Full density Co-W magnetic sputter targetsAbandonedJan 11, 07Jul 17, 08[B22F, C22C]
2008/0166,255 HIGH DENSITY, LOW OXYGEN RE AND RE-BASED CONSOLIDATED POWDER MATERIALS FOR USE AS DEPOSITION SOURCES & METHODS OF MAKING SAMEAbandonedJan 03, 08Jul 10, 08[B22F, C22C]
2008/0166,596 RE-BASED ALLOYS USABLE AS DEPOSITION TARGETS FOR FORMING INTERLAYERS IN GRANULAR PERPENDICULAR MAGNETIC RECORDING MEDIA & MEDIA UTILIZING SAID ALLOYSAbandonedOct 23, 07Jul 10, 08[C23C, B05D, G11B, C22C]
2008/0150,523 Apparatus for a magnetic field detector holding assembly for a PTF measurement standAbandonedDec 20, 06Jun 26, 08[G01R]
2008/0145,692 MAGNETIC PULSE-ASSISTED CASTING OF METAL ALLOYS & METAL ALLOYS PRODUCED THEREBYAbandonedDec 04, 07Jun 19, 08[B29C, H01F]
2008/0131,735 Ni-X, Ni-Y, and Ni-X-Y alloys with or without oxides as sputter targets for perpendicular magnetic recordingAbandonedDec 05, 06Jun 05, 08[C23C, G11B]
2008/0116,887 Method and apparatus for automation of PTF measurement in sputter targetsAbandonedNov 20, 06May 22, 08[G01R]

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