HERMES MICROVISION, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 8654
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 23183
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 14348
 
  
 
G06K RECOGNITION OF DATA; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS 12186
 
  
 
G06T IMAGE DATA PROCESSING OR GENERATION, IN GENERAL 6129
 
  
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 640
 
  
 
G01T MEASUREMENT OF NUCLEAR OR X-RADIATION 547
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 599
 
  
 
A61N ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY 4103
 
  
 
H04N PICTORIAL COMMUNICATION, e.g. TELEVISION 4238

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0076,099 METHOD AND MACHINE FOR EXAMINING WAFERSSep 18, 17Mar 15, 18[H01L, G05B, G01N]
2017/0025,241 Apparatus of Plural Charged-Particle BeamsJul 19, 16Jan 26, 17[H01J]
2015/0325,402 Method and System for Inspecting an EUV MaskJul 10, 15Nov 12, 15[H01J]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9922799 Apparatus of plural charged-particle beamsJul 19, 16Mar 20, 18[H01J]
9859089 Method and system for inspecting and grounding an EUV maskJul 10, 15Jan 02, 18[H01J]
9812283 Charged particle sourceJan 12, 17Nov 07, 17[H01J]
9799484 Charged particle sourceDec 09, 15Oct 24, 17[H01J]
9768082 Method and machine for examining wafersAug 20, 12Sep 19, 17[H01L, G05B, G01N, G06F]
9754760 Charged particle sourceJan 12, 17Sep 05, 17[H01J]
9691586 Apparatus of plural charged-particle beamsJan 11, 17Jun 27, 17[H01J]
9691588 Apparatus of plural charged-particle beamsMar 09, 16Jun 27, 17[H01J]
9605759 Metal seal for ultra high vacuum systemDec 11, 14Mar 28, 17[F16L, F16J]
9607805 Apparatus of plural charged-particle beamsMay 10, 16Mar 28, 17[H01J]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2012/0080,056 SYSTEM AND METHOD FOR REMOVING ORGANIC RESIDUE FROM A CHARGED PARTICLE BEAM SYSTEMAbandonedDec 12, 11Apr 05, 12[B08B]
2011/0084,591 THERMAL FIELD EMISSION CATHODEAbandonedDec 17, 10Apr 14, 11[H01J]
2010/0302,520 CLUSTER E-BEAM LITHOGRAPHY SYSTEMAbandonedAug 12, 10Dec 02, 10[H01J, G03B]
2010/0211,202 METHOD AND MACHINE FOR EXAMINING WAFERSAbandonedFeb 13, 09Aug 19, 10[G06F]
2010/0158,346 METHOD AND SYSTEM OF CLASSIFYING DEFECTS ON A WAFERAbandonedDec 23, 08Jun 24, 10[G06K]
2009/0121,159 CLUSTER E-BEAM LITHOGRAPHY SYSTEMAbandonedOct 27, 08May 14, 09[A61N]
2009/0080,763 METHOD AND SYSTEM FOR THE VISUAL CLASSIFICATION OF DEFECTSAbandonedNov 25, 08Mar 26, 09[G06T]
2008/0296,496 METHOD AND APPARATUS OF WAFER SURFACE POTENTIAL REGULATIONAbandonedMay 30, 07Dec 04, 08[G01N]
2008/0267,489 METHOD FOR DETERMINING ABNORMAL CHARACTERISTICS IN INTEGRATED CIRCUIT MANUFACTURING PROCESSAbandonedApr 24, 08Oct 30, 08[G06K]
2008/0175,468 METHOD AND SYSTEM FOR CREATING KNOWLEDGE AND SELECTING FEATURES IN A SEMICONDUCTOR DEVICEAbandonedJan 24, 07Jul 24, 08[G06T]
2005/0152,594 Method and system for monitoring IC processAbandonedNov 09, 04Jul 14, 05[G06K]

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