Fontana Technology

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C11D DETERGENT COMPOSITIONS 659
 
  
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 553
 
  
 
C23G CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS 49
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 3359
 
  
 
B28D WORKING STONE OR STONE-LIKE MATERIALS 121
 
  
 
C07C ACYCLIC OR CARBOCYCLIC COMPOUNDS 1137
 
  
 
C08F MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS 1124
 
  
 
C10M LUBRICATING COMPOSITIONS 148
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1103

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
RE46454 Particle removal method using an aqueous polyphosphate solutionDec 31, 15Jun 27, 17[H01L, B08B, C23G, G03F, C11D]
9275850 Method for cleaning wafers using a polycarboxylate solutionJul 29, 13Mar 01, 16[H01L, C08F, B08B, C07C, C11D]
8945316 Method for shaping and slicing ingots using an aqueous phosphate solutionNov 18, 11Feb 03, 15[B28D, H01L, C10M, B08B, G03F, C11D]
8764906 Particle removal method using an aqueous polyphosphate solutionDec 24, 12Jul 01, 14[B08B, C23G, C11D]
8496757 Method for cleaning wafers using a polycarboxylate solutionJul 22, 12Jul 30, 13[C11D]
8337624 Particle removal method using an aqueous polyphosphate solutionDec 11, 11Dec 25, 12[B08B, C23G, C11D]
8226773 Method and composition for cleaning wafersDec 08, 08Jul 24, 12[B08B, C11D]
8075697 Particle removal method and compositionFeb 07, 08Dec 13, 11[C23G, C11D]
7959739 Particle removal cleaning method and compositionDec 08, 08Jun 14, 11[B08B, C11D]

Expired/Abandoned/Withdrawn Patents

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Top Inventors for This Owner

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