Fine Semitech Corp.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 3101
 
  
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 157
 
  
 
C09J ADHESIVES; ADHESIVE PROCESSES IN GENERAL 154
 
  
 
C25D PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING 150
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 177

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9436077 Method of fabricating a pellicle frameMar 14, 13Sep 06, 16[C25D, G03F]
8779403 Apparatus and method for generating extreme ultra violet radiationDec 11, 13Jul 15, 14[G01J]
8404405 Pellicle frame, pellicle, lithography apparatus, and method of fabricating the pellicle frameSep 10, 10Mar 26, 13[G03F, B32B]

Expired/Abandoned/Withdrawn Patents

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