FUJITSU Corporation

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
 
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1103

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9223204 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the sameNov 06, 12Dec 29, 15[G03F]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2013/0207,310 NANOIMPRINTING MOLD, METHOD FOR PRODUCING THE NANOIMPRINTING MOLD, AND NANOIMPRINTING METHOD EMPLOYING THE NANOIMPRINTING MOLDAbandonedMar 26, 13Aug 15, 13[B29C]
5981960 Charged particle beam exposure method and apparatus thereforExpiredOct 02, 96Nov 09, 99[H01J]

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