FUJIMI INCORPORATED
Patent Owner
Stats
- 90 US PATENTS IN FORCE
- 35 US APPLICATIONS PENDING
- Mar 13, 2018 most recent publication
Details
- 90 Issued Patents
- 0 Issued in last 3 years
- 0 Published in last 3 years
- 2,421 Total Citation Count
- Jan 18, 1989 Earliest Filing
- 122 Expired/Abandoned/Withdrawn Patents
Patent Activity in the Last 10 Years
Technologies
Intl Class
Technology
Matters
Rank in Class
Top Patents (by citation)
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Recent Publications
Publication #
Title
Filing Date
Pub Date
Intl Class
2018/0030,313 METHOD FOR POLISHING SILICON WAFER AND SURFACE TREATMENT COMPOSITIONJan 22, 16Feb 01, 18[C09K, B24B, H01L, C09G]
2018/0022,960 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING HARD BRITTLE MATERIAL SUBSTRATEFeb 12, 16Jan 25, 18[C09K, B24B, C09G]
2017/0355,881 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING CERAMIC COMPONENTNov 26, 15Dec 14, 17[C09K, C09G]
2017/0355,882 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING CERAMIC COMPONENTNov 26, 15Dec 14, 17[C09K, C09G, C04B]
2017/0312,880 CHEMICAL MECHANICAL POLISHING APPARATUS FOR POLISHING WORKPIECEOct 30, 15Nov 02, 17[B24B]
2017/0292,039 POLISHING COMPOSITION, METHOD FOR MANUFACTURING SAME, AND POLISHING METHODJul 27, 15Oct 12, 17[B24B, H01L, C09G]
Recent Patents
Patent #
Title
Filing Date
Issue Date
Intl Class
9879156 Polishing compositionFeb 07, 14Jan 30, 18[C09K, B24B, H01L, C03C, C09G, C23F, C30B, B44C, C25F]
9796881 Polishing composition and method using said polishing composition to manufacture compound semiconductor substrateMar 04, 13Oct 24, 17[B24B, H01L, C09G]
9682892 Powder for thermal spraying, thermal sprayed coating, and method for forming thermal sprayed coatingMar 07, 14Jun 20, 17[C23C, C04B]
9685341 Abrasive composition and method for producing semiconductor substrateMar 12, 13Jun 20, 17[C09K, B24B, H01L, C09G]
9685343 Method for producing polished object and polishing composition kitJun 12, 14Jun 20, 17[C09K, B24B, H01L, C09G]
Expired/Abandoned/Withdrawn Patents
Patent #
Title
Status
Filing Date
Issue/Pub Date
Intl Class
2016/0136,784 Polishing Composition and Polishing MethodAbandonedJan 22, 16May 19, 16[B24C, H01L, C09G, C23F]
2015/0251,293 POLISHING METHOD AND METHOD FOR PRODUCING ALLOY MATERIALAbandonedOct 01, 13Sep 10, 15[B24B]
2015/0166,838 POLISHING COMPOSITION, MANUFACTURING PROCESS THEREFOR, UNDILUTED LIQUID, PROCESS FOR PRODUCING SILICON SUBSTRATE, AND SILICON SUBSTRATEAbandonedJan 16, 13Jun 18, 15[B24B, C01B, C09G]
2015/0166,839 POLISHING COMPOSITION AND SUBSTRATE FABRICATION METHOD USING SAMEAbandonedJun 17, 13Jun 18, 15[C09G]
2015/0166,862 COMPOSITION FOR POLISHING ALLOY MATERIAL AND METHOD FOR PRODUCING ALLOY MATERIAL USING SAMEAbandonedJul 16, 13Jun 18, 15[C09K]
2015/0014,579 POLISHING COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATEAbandonedFeb 05, 13Jan 15, 15[B24B, H01L, C09G]
2014/0308,155 METHOD FOR POLISHING ALLOY MATERIAL AND METHOD FOR PRODUCING ALLOY MATERIALAbandonedNov 19, 12Oct 16, 14[C09G]
2014/0263,167 POLISHING COMPOSITION AND POLISHING METHOD USING SAME, AND SUBSTRATE MANUFACTURING METHODAbandonedNov 08, 12Sep 18, 14[C09G, H05K]
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