EMD Corporation

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 5123
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 398
 
  
 
H05H PLASMA TECHNIQUE 327
 
  
 
C03C CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS159
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 135
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 1361
 
  
 
H01Q AERIALS 1109

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2014/0216,928 THIN-FILM FORMATION SPUTTERING DEVICEAug 30, 11Aug 07, 14[H01J]
2014/0210,337 ANTENNA FOR PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING DEVICE USING THE SAMEAug 30, 11Jul 31, 14[H01J]
2014/0150,975 PLASMA PROCESSING DEVICESep 06, 10Jun 05, 14[H01J]
2013/0220,548 PLASMA PROCESSING DEVICESep 09, 11Aug 29, 13[H05H]
2013/0192,759 PLASMA PROCESSING DEVICEAug 02, 11Aug 01, 13[H01L]
2012/0031,563 PLASMA PROCESSING DEVICEMar 10, 10Feb 09, 12[C23F]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9078336 Radio-frequency antenna unit and plasma processing apparatusMar 03, 09Jul 07, 15[H01J, H01Q, H05H]
8931433 Plasma processing apparatusNov 12, 08Jan 13, 15[C23C, H01J, C03C]
8916034 Thin-film forming sputtering systemAug 25, 09Dec 23, 14[C23C, H01J]
8917022 Plasma generation device and plasma processing deviceMay 21, 09Dec 23, 14[H01J, H05H]
7880392 Plasma producing method and apparatus as well as plasma processing apparatusOct 26, 06Feb 01, 11[C23C]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2013/0043,128 SPUTTERING SYSTEMAbandonedMar 08, 11Feb 21, 13[C23C]
2012/0031,562 PLASMA PROCESSING APPARATUSAbandonedMar 10, 10Feb 09, 12[C23F]
7988835 Silicon dot forming method and silicon dot forming apparatusExpiredSep 12, 06Aug 02, 11[C23C]
2007/0293,056 Surface Modification Method for Solid Sample, Impurity Activation Method, and Method for Manufacturing Semiconductor DeviceAbandonedApr 28, 05Dec 20, 07[H01L]
2007/0193,512 Plasma generating method, plasma generating apparatus, and plasma processing apparatusAbandonedFeb 20, 07Aug 23, 07[C23C]
2007/0193,513 Plasma generating method, plasma generating apparatus, and plasma processing apparatusAbandonedFeb 20, 07Aug 23, 07[C23C]
2007/0144,672 Plasma producing method and apparatus as well as plasma processing apparatusAbandonedOct 26, 06Jun 28, 07[C23C, C23F]
2007/0007,128 Silicon film forming apparatusAbandonedSep 12, 06Jan 11, 07[C23C]
2007/0004,111 Method and apparatus for forming a crystalline silicon thin filmAbandonedSep 12, 06Jan 04, 07[H01L]

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