DONGJIN SEMICHEM CO., LTD.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
 
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1985
 
 
 
C09D COATING COMPOSITIONS, e.g. PAINTS, VARNISHES, LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR 983
 
 
 
C09K MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR986
 
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 8354
 
 
 
C07D HETEROCYCLIC COMPOUNDS 7155
 
 
 
C08G MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS 7113
 
 
 
C07C ACYCLIC OR CARBOCYCLIC COMPOUNDS 6132
 
 
 
C11D DETERGENT COMPOSITIONS 560
 
 
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 483
 
 
 
C03C CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS357

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0199,459 METHODS OF FORMING PATTERNS USING COMPOSITIONS FOR AN UNDERLAYER OF PHOTORESISTJan 13, 17Jul 13, 17[H01L, C08G, C09D, G03F]
2017/0096,601 LIQUID CRYSTAL COMPOSITIONSep 29, 16Apr 06, 17[C09K]
2016/0307,660 Carbon-Metal Composite and Method for Preparing the SameJun 24, 16Oct 20, 16[C09D, H01B]
2015/0315,460 LUMINESCENT QUANTUM DOTDec 03, 13Nov 05, 15[C09K, H01L]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9783735 Liquid crystal display device and liquid crystal composition used thereforMar 03, 16Oct 10, 17[C09K, C07D, C07C]
9651867 Compound and composition for forming lower film of resist pattern, and method for forming lower film using sameSep 12, 13May 16, 17[H01L, G03F]
9593241 Resin composition for encapsulating optical elementFeb 24, 14Mar 14, 17[H01L, C08G, C08L]
9469763 Photo-curable organic-inorganic hybrid resin compositionJan 23, 14Oct 18, 16[C09J, C08G, C08L, C08K]
9460826 Conductive composition for forming a ground electrode of a liquid crystal display, and a method of forming a ground electrode using the sameDec 03, 12Oct 04, 16[B05D, C09D, H01B, G02F]
9423692 Composition for forming resist protection film for lithography and method for forming pattern of semiconductor device using the sameSep 11, 15Aug 23, 16[C09D, G03F]
9416296 Resist underlayer composition and method for forming pattern using sameMar 24, 14Aug 16, 16[C03C, C09D, C23F, G03F, B44C]
9170495 Phenol monomer, polymer for forming a resist underlayer film including same, and composition for a resist underlayer film including sameNov 01, 12Oct 27, 15[C08G, C07D, C09D, G03F]
9068941 Apparatus for monitoring a dye solution to be adsorbed to a dye-sensitized solar cell, and apparatus for adjusting the dye solutionMar 08, 10Jun 30, 15[H01L, G01N, B65B, H01G]
9063424 Isocyanurate compound for forming organic anti-reflective layer and composition including sameSep 14, 10Jun 23, 15[H01L, C08G, B05D, C08F, C07D, G03F, C08L, C08K]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0311,721 GLASS COMPOSITION AND ELECTRODE COMPOSITIONAbandonedJul 07, 16Oct 27, 16[C03C, H01L]
2014/0287,587 Method for Forming Fine Patterns of Semiconductor Device Using Directed Self-Assembly ProcessAbandonedSep 27, 12Sep 25, 14[H01L]
2014/0242,520 I-LINE PHOTORESIST COMPOSITION AND METHOD FOR FORMING FINE PATTERN USING SAMEAbandonedSep 21, 12Aug 28, 14[G03F]
2014/0227,887 PHENOL-BASED SELF-CROSSLINKING POLYMER AND RESIST UNDERLAYER FILM COMPOSITION INCLUDING SAMEAbandonedSep 05, 12Aug 14, 14[H01L]
2013/0233,370 DYE-SENSITIZED SOLAR CELL AND METHOD OF PREPARING THE SAMEAbandonedApr 26, 13Sep 12, 13[H01G]
8512598 Liquid crystal compounds and method for preparing the sameExpiredDec 14, 09Aug 20, 13[C09K, C07C]
2013/0115,733 ETCHANT COMPOSITION AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR USING THE SAMEAbandonedJul 12, 12May 09, 13[C09K, H01L]
8293458 Method for forming fine pattern in semiconductor deviceExpiredNov 13, 09Oct 23, 12[G03F]
2012/0180,864 PASTE FOR FORMING OF AN ELECTRODE OF A SOLAR CELLAbandonedJul 16, 10Jul 19, 12[H01L, H01B]
2012/0132,276 DYE SENSITIZED SOLAR CELL AND DYE SENSITIZED SOLAR CELL MODULE USING THE SAMEAbandonedJul 30, 10May 31, 12[H01L]
8178639 Polymer for forming organic anti-reflective coating layerExpiredJun 16, 09May 15, 12[B05D, C08F, G03F, C08L]
2012/0111,404 THERMOSETTING ELECTRODE PASTE FIREABLE AT A LOW TEMPERATUREAbandonedJul 16, 10May 10, 12[H01L, H01B, H05K]
2012/0061,626 PASTE COMPOSITION USED FOR FORMING AN ELECTRODE OR WIRING WHICH IS CURABLE AT A LOW TEMPERATUREAbandonedMar 30, 10Mar 15, 12[B05D, H01B, H05K]
8124311 Photosensitive molecular compound and photoresist composition including the sameExpiredJan 29, 09Feb 28, 12[G03F]
8043789 Photosensitive compound and photoresist composition including the sameExpiredDec 17, 08Oct 25, 11[G03F]
8026042 Polymer for organic anti-reflective coating layer and composition including the sameExpiredJul 14, 10Sep 27, 11[C08J, H01L, C08G, G03F, C08L, C08K]
7964521 Getter paste compositionExpiredSep 04, 08Jun 21, 11[H01J, C03C, C03B, B29C]
7947423 Photosensitive compound and photoresist composition including the sameExpiredSep 11, 08May 24, 11[C07C, G03F]
7935474 Acid-amplifier having acetal group and photoresist composition including the sameExpiredJul 17, 08May 03, 11[G03F]
2011/0094,588 NOVEL ORGANIC DYE AND PREPARATION THEREOFAbandonedJun 29, 09Apr 28, 11[H01L, C07D]

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