CYMER, LLC

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01S DEVICES USING STIMULATED EMISSION2167
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS1782
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 1563
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1589
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 10352
 
  
 
B23K SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 984
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 8197
 
  
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 889
 
  
 
A63C SKATES; SKIS; ROLLER SKATES; DESIGN OR LAYOUT OF COURTS, RINKS OR THE LIKE 521
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 4202

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0006,425 ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLESSep 11, 17Jan 04, 18[H01S, G03F]
2016/0299,441 WAVELENGTH STABILIZATION FOR AN OPTICAL SOURCEApr 08, 15Oct 13, 16[G03F]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9835959 Controlling for wafer stage vibrationOct 17, 16Dec 05, 17[G03B, G03F]
9831628 System and method for automatic gas optimization in a two-chamber gas discharge laser systemAug 14, 15Nov 28, 17[H01S]
9819136 Gas mixture control in a gas discharge light sourceApr 19, 16Nov 14, 17[H01S]
9785050 Pulsed light beam spectral feature controlJul 08, 15Oct 10, 17[G02B, H01S, G01B, G03F]
9778108 Metrology system and method having a plurality of sensors for estimating a spectral feature of a pulsed light beamMay 22, 15Oct 03, 17[G01J]
9772556 Pulsed light beam spectral feature controlFeb 17, 17Sep 26, 17[G01J, G02B, H01S, G03F]
9762023 Online calibration for repetition rate dependent performance variablesDec 21, 15Sep 12, 17[G01J, G03B, H01S, G03F]
9715180 Wafer-based light source parameter controlJun 04, 14Jul 25, 17[G03B, G03F]
9709897 Polarization control of pulsed light beamOct 28, 15Jul 18, 17[G03B, G03F]
9634455 Gas optimization in a gas discharge light sourceFeb 16, 16Apr 25, 17[H01S]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
8653492 Target for laser produced plasma extreme ultraviolet light sourceWithdrawnMar 14, 13Feb 18, 14[H05G]
8624209 Controlling spatial properties in an excimer ring amplifierExpiredMar 14, 13Jan 07, 14[H01S]
2009/0296,758 Laser systemAbandonedOct 31, 07Dec 03, 09[H01S]
2008/0013,589 Window assembly for a gas discharge laser chamberAbandonedJul 17, 06Jan 17, 08[H01S]
7006547 Very high repetition rate narrow band gas discharge laser systemExpiredMar 31, 04Feb 28, 06[H01S]
6963595 Automatic gas control system for a gas discharge laserExpiredJan 31, 03Nov 08, 05[H01S]
6556600 Injection seeded F2 laser with centerline wavelength controlExpiredMay 14, 01Apr 29, 03[H01S]
6485380 Sports implementExpiredJan 12, 01Nov 26, 02[A63B]
6454303 Method and apparatus for vibration controlExpiredFeb 09, 01Sep 24, 02[B62D]

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