CARL ZEISS SMT GMBH

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 62017
 
  
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 5278
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 4947
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS10918
 
  
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 726
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 33173
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 3247
 
  
 
F21V FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR 2486
 
  
 
G06K RECOGNITION OF DATA; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS 21177
 
  
 
B82Y SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE  OR TREATMENT OF NANO-STRUCTURES1835

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0074,303 IMAGING OPTICAL UNIT AND PROJECTION EXPOSURE UNIT INCLUDING SAMEOct 10, 17Mar 15, 18[G02B, G03F]
2018/0039,184 PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY AND METHOD OF MONITORING A LATERAL IMAGING STABILITYJul 18, 17Feb 08, 18[G03F]
2018/0031,815 CATADIOPTRIC PROJECTION OBJECTIVE WITH PARALLEL, OFFSET OPTICAL AXESAug 22, 17Feb 01, 18[G02B, G03F]
2018/0031,827 LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENTJul 11, 17Feb 01, 18[G02B, G03F]
2017/0363,861 DEVICE FOR SWIVELING A MIRROR ELEMENT WITH TWO DEGREES OF SWIVELING FREEDOMAug 31, 17Dec 21, 17[G02B, G01D, G03F]
2017/0363,963 Catadioptric Projection Objective With Intermediate ImagesJun 30, 17Dec 21, 17[G02B, G03F]
2017/0329,233 POLARIZATION-MODULATING OPTICAL ELEMENTAug 02, 17Nov 16, 17[G02B, G03F]
2017/0322,343 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUSJul 24, 17Nov 09, 17[G02B, G03F]
2017/0284,893 OPTICAL DEVICEFeb 10, 17Oct 05, 17[G01M, G03F]
2017/0285,311 ZOOM SYSTEM WITH INTERCHANGEABLE OPTICAL ELEMENTSJun 22, 17Oct 05, 17[G02B, G03F]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9921483 Surface correction of mirrors with decoupling coatingDec 28, 15Mar 20, 18[G21K, G02B, G03B, H05G, G03F]
9921484 Illumination system and illumination optical unit for EUV projection lithographyMar 11, 16Mar 20, 18[G03F]
9915871 Method for measuring an angularly resolved intensity distribution and projection exposure apparatusJul 10, 15Mar 13, 18[G01J, G01B, G03F]
9915872 Optical componentDec 22, 15Mar 13, 18[G02B, G03B, G03F]
9915873 Reflective optical element, and optical system of a microlithographic projection exposure apparatusMay 20, 16Mar 13, 18[G21K, G02B, G03F]
9915874 Illumination optical unit and illumination system for EUV projection lithographyMar 04, 16Mar 13, 18[G02B, G03F]
9915875 Illumination optical assembly for projection lithographyFeb 22, 17Mar 13, 18[G03B, G03F]
9915876 EUV mirror and optical system comprising EUV mirrorJul 10, 15Mar 13, 18[B82Y, G21K, G02B, G03B, G03F]
9910065 Apparatus and method for examining a surface of a maskMay 19, 16Mar 06, 18[G01Q, G01B, G03F]
9910193 Reflective optical element and EUV lithography applianceOct 31, 14Mar 06, 18[B82Y, G21K, G02B, G03F]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2017/0176,741 MIRROR ELEMENT, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUSAbandonedDec 16, 16Jun 22, 17[G02B, G03F]
2016/0334,719 SUBASSEMBLY OF AN OPTICAL SYSTEM, IN PARTICULAR IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUSAbandonedJul 25, 16Nov 17, 16[G03F]
9470982 Polarization-modulating optical elementWithdrawnJul 02, 13Oct 18, 16[G02B, G03B, G03F]
2016/0299,268 METHOD FOR CORRECTING THE SURFACE FORM OF A MIRRORAbandonedApr 21, 16Oct 13, 16[G21K, G02B, G03F]
2016/0274,343 CATADIOPTRIC PROJECTION OBJECTIVEAbandonedNov 23, 15Sep 22, 16[G02B]
9448489 Optical system for a microlithographic projection exposure apparatus and microlithographic exposure methodWithdrawnJan 30, 15Sep 20, 16[G02B, G03B, G03F]
2016/0207,078 OPTICAL ARRANGEMENT, IN PARTICULAR PLASMA LIGHT SOURCE OR EUV LITHOGRAPHY SYSTEMAbandonedMar 28, 16Jul 21, 16[B08B]
2016/0161,852 MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHOD FOR PROCESSING A MIRRORAbandonedJan 13, 16Jun 09, 16[G02B, H05G, G03F]
2016/0116,851 PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROLITHOGRAPHIC IMAGINGAbandonedOct 13, 15Apr 28, 16[G03F]
2016/0077,442 OPTICAL COMPONENTAbandonedNov 13, 15Mar 17, 16[G02B, G03F]
2016/0004,165 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHYAbandonedSep 09, 15Jan 07, 16[G02B, G03F]
2015/0235,829 METHOD FOR MASS SPECTROMETRIC EXAMINATION OF GAS MIXTURES AND MASS SPECTROMETER THEREFORAbandonedMar 16, 15Aug 20, 15[H01J]
2015/0227,052 PROJECTION EXPOSURE METHOD, SYSTEM AND OBJECTIVEAbandonedApr 10, 15Aug 13, 15[G03F]
2015/0219,874 COOLING SYSTEM FOR AT LEAST ONE SYSTEM COMPONENT OF AN OPTICAL SYSTEM FOR EUV APPLICATIONS AND SYSTEM COMPONENT OF THIS TYPE AND OPTICAL SYSTEM OF THIS TYPEAbandonedApr 13, 15Aug 06, 15[G02B, G03F]
2015/0185,469 METHOD FOR REGULATING THE TILTING OF A MIRROR ELEMENTAbandonedMar 10, 15Jul 02, 15[G02B, G03F]
2015/0168,853 LITHOGRAPHY APPARATUS WITH RESTRICTED MOVEMENT RELATIVE TO FLOOR AND RELATED METHODAbandonedDec 22, 14Jun 18, 15[G03F]
2015/0092,170 METHOD FOR REPAIRING OPTICAL ELEMENTS, AND OPTICAL ELEMENTAbandonedOct 21, 14Apr 02, 15[G03F]
2015/0083,938 COOLER FOR PLASMA GENERATION CHAMBER OF EUV RADIATION SOURCEAbandonedSep 22, 14Mar 26, 15[G02B, F28D, F28F, H05G]
2015/0055,214 CATADIOPTRIC PROJECTION OBJECTIVEAbandonedOct 31, 14Feb 26, 15[G02B, G03F]
8928858 Projection exposure apparatus with optimized adjustment possibilityWithdrawnMar 22, 12Jan 06, 15[G03B, G03F]

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