CARL ZEISS SMT GMBH
Patent Owner
Stats
- 1,220 US PATENTS IN FORCE
- 58 US APPLICATIONS PENDING
- Mar 20, 2018 most recent publication
Details
- 1,220 Issued Patents
- 0 Issued in last 3 years
- 0 Published in last 3 years
- 19,501 Total Citation Count
- May 04, 1999 Earliest Filing
- 227 Expired/Abandoned/Withdrawn Patents
Patent Activity in the Last 10 Years
Technologies
Intl Class
Technology
Matters
Rank in Class
Top Patents (by citation)
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Recent Publications
Publication #
Title
Filing Date
Pub Date
Intl Class
2018/0074,303 IMAGING OPTICAL UNIT AND PROJECTION EXPOSURE UNIT INCLUDING SAMEOct 10, 17Mar 15, 18[G02B, G03F]
2018/0039,184 PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY AND METHOD OF MONITORING A LATERAL IMAGING STABILITYJul 18, 17Feb 08, 18[G03F]
2018/0031,815 CATADIOPTRIC PROJECTION OBJECTIVE WITH PARALLEL, OFFSET OPTICAL AXESAug 22, 17Feb 01, 18[G02B, G03F]
2018/0031,827 LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENTJul 11, 17Feb 01, 18[G02B, G03F]
2017/0363,861 DEVICE FOR SWIVELING A MIRROR ELEMENT WITH TWO DEGREES OF SWIVELING FREEDOMAug 31, 17Dec 21, 17[G02B, G01D, G03F]
2017/0363,963 Catadioptric Projection Objective With Intermediate ImagesJun 30, 17Dec 21, 17[G02B, G03F]
Recent Patents
Patent #
Title
Filing Date
Issue Date
Intl Class
9921483 Surface correction of mirrors with decoupling coatingDec 28, 15Mar 20, 18[G21K, G02B, G03B, H05G, G03F]
9921484 Illumination system and illumination optical unit for EUV projection lithographyMar 11, 16Mar 20, 18[G03F]
9915871 Method for measuring an angularly resolved intensity distribution and projection exposure apparatusJul 10, 15Mar 13, 18[G01J, G01B, G03F]
9915873 Reflective optical element, and optical system of a microlithographic projection exposure apparatusMay 20, 16Mar 13, 18[G21K, G02B, G03F]
9915874 Illumination optical unit and illumination system for EUV projection lithographyMar 04, 16Mar 13, 18[G02B, G03F]
9915876 EUV mirror and optical system comprising EUV mirrorJul 10, 15Mar 13, 18[B82Y, G21K, G02B, G03B, G03F]
9910065 Apparatus and method for examining a surface of a maskMay 19, 16Mar 06, 18[G01Q, G01B, G03F]
9910193 Reflective optical element and EUV lithography applianceOct 31, 14Mar 06, 18[B82Y, G21K, G02B, G03F]
Expired/Abandoned/Withdrawn Patents
Patent #
Title
Status
Filing Date
Issue/Pub Date
Intl Class
2017/0176,741 MIRROR ELEMENT, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUSAbandonedDec 16, 16Jun 22, 17[G02B, G03F]
2016/0334,719 SUBASSEMBLY OF AN OPTICAL SYSTEM, IN PARTICULAR IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUSAbandonedJul 25, 16Nov 17, 16[G03F]
2016/0299,268 METHOD FOR CORRECTING THE SURFACE FORM OF A MIRRORAbandonedApr 21, 16Oct 13, 16[G21K, G02B, G03F]
9448489 Optical system for a microlithographic projection exposure apparatus and microlithographic exposure methodWithdrawnJan 30, 15Sep 20, 16[G02B, G03B, G03F]
2016/0207,078 OPTICAL ARRANGEMENT, IN PARTICULAR PLASMA LIGHT SOURCE OR EUV LITHOGRAPHY SYSTEMAbandonedMar 28, 16Jul 21, 16[B08B]
2016/0161,852 MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHOD FOR PROCESSING A MIRRORAbandonedJan 13, 16Jun 09, 16[G02B, H05G, G03F]
2016/0116,851 PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROLITHOGRAPHIC IMAGINGAbandonedOct 13, 15Apr 28, 16[G03F]
2016/0004,165 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHYAbandonedSep 09, 15Jan 07, 16[G02B, G03F]
2015/0235,829 METHOD FOR MASS SPECTROMETRIC EXAMINATION OF GAS MIXTURES AND MASS SPECTROMETER THEREFORAbandonedMar 16, 15Aug 20, 15[H01J]
2015/0219,874 COOLING SYSTEM FOR AT LEAST ONE SYSTEM COMPONENT OF AN OPTICAL SYSTEM FOR EUV APPLICATIONS AND SYSTEM COMPONENT OF THIS TYPE AND OPTICAL SYSTEM OF THIS TYPEAbandonedApr 13, 15Aug 06, 15[G02B, G03F]
2015/0185,469 METHOD FOR REGULATING THE TILTING OF A MIRROR ELEMENTAbandonedMar 10, 15Jul 02, 15[G02B, G03F]
2015/0168,853 LITHOGRAPHY APPARATUS WITH RESTRICTED MOVEMENT RELATIVE TO FLOOR AND RELATED METHODAbandonedDec 22, 14Jun 18, 15[G03F]
2015/0092,170 METHOD FOR REPAIRING OPTICAL ELEMENTS, AND OPTICAL ELEMENTAbandonedOct 21, 14Apr 02, 15[G03F]
2015/0083,938 COOLER FOR PLASMA GENERATION CHAMBER OF EUV RADIATION SOURCEAbandonedSep 22, 14Mar 26, 15[G02B, F28D, F28F, H05G]
8928858 Projection exposure apparatus with optimized adjustment possibilityWithdrawnMar 22, 12Jan 06, 15[G03B, G03F]
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