CARL ZEISS SMS GMBH

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Patent Activity in the Last 10 Years

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Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 135
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 1205
 
  
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 145

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
7868290 Material processing system and methodSep 26, 08Jan 11, 11[G01N]
7452477 Procedure for etching of materials at the surface with focussed electron beam induced chemical reaction at said surfaceJul 28, 03Nov 18, 08[C23F]
7435973 Material processing system and methodAug 07, 06Oct 14, 08[G21K]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2012/0154,773 METHOD AND APPARATUS FOR CORRECTING ERRORS ON A WAFER PROCESSED BY A PHOTOLITHOGRAPHIC MASKAbandonedDec 02, 11Jun 21, 12[G03B]
2010/0297,362 METHOD FOR PROCESSING AN OBJECT WITH MINIATURIZED STRUCTURESAbandonedAug 02, 10Nov 25, 10[C23C]
2010/0153,059 APPARATUS AND METHOD FOR MEASURING THE POSITIONS OF MARKS ON A MASKAbandonedMar 11, 08Jun 17, 10[G06F, G01B]
2009/0121,488 Electric power generation system driven by solar flux and geocoolingAbandonedNov 08, 07May 14, 09[F24J, H02P, F25B, F25D]
2007/0070,502 Illuminating and imaging system comprising a diffractive beam splitterAbandonedApr 20, 04Mar 29, 07[G02B]
2006/0269,117 Method for analysis of objects in microlithographyAbandonedJul 03, 04Nov 30, 06[G06K]
2006/0154,150 Arrangement for the production of photomasksAbandonedJul 09, 03Jul 13, 06[G03F]
2005/0116,144 Light detector with enhanced quantum efficiencyAbandonedSep 10, 04Jun 02, 05[H01J, H01L]

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