CARL ZEISS NTS GMBH

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
 
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 3296
 
 
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 12194
 
 
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 442
 
 
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1100
 
 
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS198
 
 
 
G01K MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR 145
 
 
 
G01M TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR166
 
 
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 1158
 
 
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 1204
 
 
 
G06F ELECTRIC DIGITAL DATA PROCESSING 1446

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8415644 Processing systemApr 20, 12Apr 09, 13[H01J]
8405045 Particle beam device with deflection systemNov 29, 11Mar 26, 13[H01J]
8390152 Device and method for generating a stable high voltageMar 02, 10Mar 05, 13[G01R]
8368019 Particle beam systemSep 28, 11Feb 05, 13[H01J]
8368020 Particle beam systemSep 28, 11Feb 05, 13[H01J]
8362443 Objective lensApr 18, 12Jan 29, 13[H01J]
8330105 Phase contrast electron microscopeOct 14, 11Dec 11, 12[G21K]
8304745 Specimen holder having alignment marksMay 31, 11Nov 06, 12[H01J, G02B]
8304750 Scanning charged particle beamsDec 12, 08Nov 06, 12[H01J]
8299442 Particle beam apparatus having an annularly-shaped illumination apertureAug 13, 09Oct 30, 12[G21K]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
8064714 Method for binarizing a digital gray value image to generate a binarized gray value image and arrangement for carrying out said methodExpiredJun 08, 07Nov 22, 11[G06K]
2010/0200,750 Particle beam systemAbandonedFeb 08, 10Aug 12, 10[H01J]
2010/0024,730 Processing systemAbandonedFeb 18, 09Feb 04, 10[C23C]
7521677 Method and device for distance measurementExpiredDec 20, 06Apr 21, 09[H01J]
7135677 Beam guiding arrangement, imaging method, electron microscopy system and electron lithography systemExpiredAug 12, 03Nov 14, 06[H01J]
2006/0154,150 Arrangement for the production of photomasksAbandonedJul 09, 03Jul 13, 06[G03F]
6969854 Arrangement for holding a particle beam apparatusExpiredJul 07, 03Nov 29, 05[G01M, G01B]
6914249 Particle-optical apparatus, electron microscopy system and electron lithography systemExpiredAug 13, 03Jul 05, 05[H01J, G21G, G01N]
2005/0103,272 Material processing system and methodAbandonedAug 24, 04May 19, 05[C23C]
6891168 Particle-optical apparatus and method for operating the sameExpiredAug 13, 03May 10, 05[H01J]
6878936 Applications operating with beams of charged particlesExpiredJul 16, 03Apr 12, 05[G21K, G01N]

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