CANON NANOTECHNOLOGIES, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
B29C SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING 7118
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 4100
 
  
 
B82Y SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE  OR TREATMENT OF NANO-STRUCTURES350
 
  
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 186
 
  
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 157
 
  
 
B28B SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG OR MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER 127
 
  
 
B29K INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS 130
 
  
 
B29L INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES 125
 
  
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 196
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 1361

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2015/0165,655 Optically Absorptive Material for Alignment MarksFeb 27, 15Jun 18, 15[B29C]
2011/0031,650 Adjacent Field AlignmentJul 29, 10Feb 10, 11[B28B, B29C]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9778562 Porous template and imprinting stack for nano-imprint lithographyNov 21, 08Oct 03, 17[B82Y, G03F]
9778578 Low contact imprint lithography template chuck system for improved overlay correctionNov 07, 14Oct 03, 17[G03B, G03F]
9651862 Drop pattern generation for imprint lithography with directionally-patterned templatesJul 11, 14May 16, 17[B05D, B29C, B29K, G03F, B29L]
9514950 Methods for uniform imprint pattern transfer of sub-20 nm featuresDec 30, 14Dec 06, 16[H01L, G03F]
9227361 Imprint lithography templateSep 13, 13Jan 05, 16[B82Y, B29C, G03F]
9090014 High throughput imprint based on contact line motion tracking controlJan 26, 15Jul 28, 15[B82Y, B29C]
8961852 Templates having high contrast alignment marksFeb 04, 11Feb 24, 15[B82Y, G03F]
8394203 In-situ cleaning of an imprint lithography toolSep 21, 09Mar 12, 13[B08B]

Expired/Abandoned/Withdrawn Patents

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