BREWER SCIENCE INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 4465
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 36326
 
  
 
B32B LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM27130
 
  
 
G03C PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES 1828
 
  
 
C08G MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS 17103
 
  
 
C08L COMPOSITIONS OF MACROMOLECULAR COMPOUNDS 13103
 
  
 
C08F MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS 12113
 
  
 
C09D COATING COMPOSITIONS, e.g. PAINTS, VARNISHES, LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR 1280
 
  
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 1176
 
  
 
C07C ACYCLIC OR CARBOCYCLIC COMPOUNDS 6132

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0067,066 ENERGETIC PULSE CLEARING OF ENVIRONMENTALLY SENSITIVE THIN-FILM DEVICESSep 05, 17Mar 08, 18[G01N]
2018/0063,963 POLYMER FILM STENCIL PROCESS FOR FAN-OUT WAFER-LEVEL PACKAGING OF SEMICONDUCTOR DEVICESAug 29, 17Mar 01, 18[H05K]
2017/0040,200 CYCLIC OLEFIN POLYMER COMPOSITIONS AND POLYSILOXANE RELEASE LAYERS FOR USE IN TEMPORARY WAFER BONDING PROCESSESOct 24, 16Feb 09, 17[C09J, H01L, C08G]
2016/0372,326 SUPERPLANARIZING SPIN-ON CARBON MATERIALSJun 21, 16Dec 22, 16[H01L, C09D]
2016/0177,128 ALL-ORGANIC HIGH REFRACTIVE INDEX MATERIALSDec 14, 15Jun 23, 16[C08G, C09D]
2013/0280,656 PHOTOSENSITIVE, DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATING MATERIALApr 22, 13Oct 24, 13[G03F]
2013/0189,524 VISCOUS FUGITIVE POLYMER-BASED CARBON NANOTUBE COATINGSJan 22, 13Jul 25, 13[C09D]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9865490 Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processesOct 24, 16Jan 09, 18[C09J, H01L, C08G, B32B]
9827740 Polyimides as laser release materials for 3-D IC applicationsJul 22, 15Nov 28, 17[H01L, B05D, C08G, C09D, B32B]
9827757 Methods of transferring device wafers or layers between carrier substrates and other surfacesJul 09, 12Nov 28, 17[H01L, B29C, B32B]
9738805 Highly soluble carbon nanotubes with enhanced conductivityJan 25, 14Aug 22, 17[C01B, B82Y, C09D, H01B]
9728439 High-temperature, spin-on, bonding compositions for temporary wafer bonding using sliding approachApr 29, 10Aug 08, 17[H01L, B29B, B32B]
9638999 Dual-layer light-sensitive developer-soluble bottom anti-reflective coatings for 193-nm lithographyFeb 19, 09May 02, 17[H01L, B05D, G03F, B32B]
9640396 Spin-on spacer materials for double- and triple-patterning lithographyJan 05, 10May 02, 17[H01L, C08G, B31D, G03F]
9642258 All-organic inductor-capacitor tank circuit for radio frequency sensor applicationsApr 18, 13May 02, 17[H01F, H05K, H01G]
9611346 Highly crosslinked polymer dielectric films for improved capacitor performanceMay 30, 14Apr 04, 17[C08G, C08F, H01G]
9496164 Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processesJan 06, 15Nov 15, 16[H01L, B32B]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2015/0122,426 MULTIPLE BONDING LAYERS FOR THIN-WAFER HANDLINGAbandonedNov 21, 14May 07, 15[H01L, B32B]
2014/0225,252 ON-TRACK REVERSE LITHOGRAPHY TO THIN MASK FOR FABRICATION OF DARK-FIELD FEATURESAbandonedFeb 12, 13Aug 14, 14[H01L]
2013/0201,635 FLUORINATED SILANE COATING COMPOSITIONS FOR THIN WAFER BONDING AND HANDLINGAbandonedFeb 08, 13Aug 08, 13[B32B, H05K]
2013/0061,869 USE OF MEGASONIC ENERGY TO ASSIST EDGE BOND REMOVAL IN A ZONAL TEMPORARY BONDING PROCESSAbandonedSep 06, 12Mar 14, 13[B08B]
2012/0213,983 MATERIALS AND METHOD UTILIZING SHORT CARBON NANOTUBES IN TRANSPARENT PRINTED ELECTRONICSAbandonedFeb 22, 12Aug 23, 12[B05D, B82Y, D01F]
2012/0043,280 IONIC REMOVAL PROCESS USING FILTER MODIFICATION BY SELECTIVE INORGANIC ION EXCHANGER EMBEDMENTAbandonedAug 20, 10Feb 23, 12[B05D, B01D]
7749603 Two-layer transparent electrostatic charge dissipating coatingExpiredFeb 11, 08Jul 06, 10[B05D, B32B]
2010/0040,988 SPIN BOWL COMPATIBLE POLYAMIC ACIDS/IMIDES AS WET DEVELOPABLE POLYMER BINDERS FOR ANTI-REFLECTIVE COATINGSAbandonedOct 20, 09Feb 18, 10[G03F]
2009/0270,299 Composition for removing protective layer in fabrication of MEMS and method for removing sameAbandonedApr 23, 08Oct 29, 09[C11D]
2009/0270,300 Composition for removing protective layer in fabrication of mems and method for removing sameAbandonedOct 22, 08Oct 29, 09[C11D]
7449230 Lithography pattern shrink process and articlesExpiredFeb 23, 05Nov 11, 08[B32B]
2008/0200,011 HIGH-TEMPERATURE, SPIN-ON, BONDING COMPOSITIONS FOR TEMPORARY WAFER BONDING USING SLIDING APPROACHAbandonedJun 14, 07Aug 21, 08[H01L]
2007/0207,406 ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERSAbandonedMar 07, 07Sep 06, 07[G03C]
2006/0068,207 Curable high refractive index resins for optoelectronic applicationsAbandonedSep 26, 05Mar 30, 06[B05D, C08F, C08K, B32B]
2005/0255,410 Anti-reflective coatings using vinyl ether crosslinkersAbandonedApr 14, 05Nov 17, 05[G03C]
6936405 Organic polymeric antireflective coatings deposited by chemical vapor depositionExpiredDec 21, 00Aug 30, 05[C23C, G03F]
6900000 Organic polymeric antireflective coatings deposited by chemical vapor depositionExpiredJun 28, 02May 31, 05[G03F]
6869747 Organic polymeric antireflective coatings deposited by chemical vapor depositionExpiredJun 28, 02Mar 22, 05[C23C, G03F]
6852473 Anti-reflective coating conformality controlExpiredApr 28, 03Feb 08, 05[G03C, B01F]
6852474 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor depositionExpiredApr 24, 03Feb 08, 05[H01L, G03C, H05K]

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