AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 3968
 
  
 
C09D COATING COMPOSITIONS, e.g. PAINTS, VARNISHES, LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR 3063
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 22340
 
  
 
C08G MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS 17103
 
  
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 1374
 
  
 
C08F MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS 9116
 
  
 
C08L COMPOSITIONS OF MACROMOLECULAR COMPOUNDS 9107
 
  
 
C08J WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER- TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C C08F, C08G or C08H 672
 
  
 
C01B NON-METALLIC ELEMENTS; COMPOUNDS THEREOF574
 
  
 
C07D HETEROCYCLIC COMPOUNDS 3159

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0017,869 Positive Type Photosensitive Siloxane Composition, Active Matrix Substrate, Display Apparatus, and Method of Manufacturing Active Matrix SubstrateFeb 03, 16Jan 18, 18[C08G, G02F, G03F]
2017/0218,227 SACRIFICIAL FILM COMPOSITION, METHOD FOR PREPARING SAME, SEMICONDUCTOR DEVICE HAVING VOIDS FORMED USING SAID COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAID COMPOSITIONJul 29, 15Aug 03, 17[H01L, C09D]
2017/0176,856 NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND USE THEREOFDec 21, 15Jun 22, 17[G03F]
2016/0018,731 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SUBSTRATE FOR DISPLAY DEVICE BY USING THE SAMEJul 16, 15Jan 21, 16[G03F]
2016/0002,494 FINE RESIST PATTERN-FORMING COMPOSITION AND PATTERN FORMING METHOD USING SAMEFeb 26, 14Jan 07, 16[C09D, G03F]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9921481 Fine resist pattern-forming composition and pattern forming method using sameFeb 26, 14Mar 20, 18[C09D, G03F]
9851635 Photoresist composition and method of manufacturing substrate for display device by using the sameJul 16, 15Dec 26, 17[H01L, C07D, G03F]
9817312 Silicon-containing heat- or photo-curable compositionOct 14, 14Nov 14, 17[C08G, C09D, G03F, C08L]
9804493 Composition for forming topcoat layer and resist pattern formation method employing the sameNov 21, 14Oct 31, 17[C09D, G03F]
9766544 Composition for forming topcoat layer and resist pattern formation method employing the sameNov 21, 14Sep 19, 17[C09D, G03F]
9676946 Coating compositionJul 01, 14Jun 13, 17[C08G, C09D]
9580567 Positive-type photosensitive siloxane compositionNov 14, 13Feb 28, 17[C08J, C09D, G03F]
9574104 Compositions and processes for self-assembly of block copolymersOct 16, 15Feb 21, 17[H01L, C08F, C09D, G03F, C08L]
9534145 Method for forming dense silicic filmOct 09, 13Jan 03, 17[C08J, C23C, C01B, B05D, C09D]
9505721 Aromatic imide compound and method for producing sameOct 28, 13Nov 29, 16[C07D, G03F]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2017/0173,562 FUNCTIONALIZED POROUS CARBON, METHODS FOR MAKING SAME, AND METHODS FOR USING SAME TO REMOVE CONTAMINANTS FROM A FLUIDAbandonedDec 22, 15Jun 22, 17[C01B, B01J, C02F]
2016/0122,580 DEFECT REDUCTION METHODS AND COMPOSITION FOR VIA FORMATION IN DIRECTED SELF-ASSEMBLY PATTERNINGAbandonedOct 30, 14May 05, 16[H01J, C09D]
2015/0309,403 ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOFAbandonedApr 29, 14Oct 29, 15[G03F]
2015/0301,452 PHOTORESIST COMPOSITION AND METHOD OF FABRICATING DISPLAY SUBSTRATE USING THE SAMEAbandonedSep 30, 14Oct 22, 15[G03F, C23F]
2015/0227,043 BOTTOM ANTIREFLECTIVE MATERIALS AND COMPOSITIONSAbandonedApr 21, 15Aug 13, 15[C09D, G02B, G03F]
2015/0004,421 INORGANIC POLYSILAZANE RESINAbandonedFeb 01, 13Jan 01, 15[C01B, C09D]
2014/0295,349 BOTTOM ANTIREFLECTIVE MATERIALS AND COMPOSITIONSAbandonedMar 28, 13Oct 02, 14[G03F]
2014/0193,753 COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATINGAbandonedFeb 19, 14Jul 10, 14[G03C, G03F]
2013/0316,515 METHOD FOR PRODUCING SILICON DIOXIDE FILMAbandonedFeb 16, 12Nov 28, 13[H01L]
2012/0017,985 Solar Cells With An Encapsulating Layer Based On PolysilazaneAbandonedMar 16, 10Jan 26, 12[H01L]
2010/0266,840 ARTICLES WITH LOW HYDROGEN PERMEATION AND THEIR USEAbandonedJul 23, 08Oct 21, 10[B32B]
2010/0166,977 Process for production a thin glasslike coating on substrates for reducing gas permeationAbandonedJul 08, 06Jul 01, 10[B05D]

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