AXCELIS TECHNOLOGIES, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 17829
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 46316
 
  
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 3514
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1289
 
  
 
H05H PLASMA TECHNIQUE 723
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 6200
 
  
 
B01D SEPARATION 5129
 
  
 
H02N ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR427
 
  
 
H05B ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR 4107
 
  
 
C01B NON-METALLIC ELEMENTS; COMPOUNDS THEREOF376

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0362,700 IMPLANTATION USING SOLID ALUMINUM IODIDE (ALI3) FOR PRODUCING ATOMIC ALUMINUM IONS AND IN SITU CLEANING OF ALUMINUM IODIDE AND ASSOCIATED BY-PRODUCTSJun 20, 17Dec 21, 17[C23C, C01B, H01L, C01F]
2017/0330,725 LANTHANATED TUNGSTEN ION SOURCE AND BEAMLINE COMPONENTSMay 11, 17Nov 16, 17[H01J]
2017/0207,057 MULTI-PIECE ELECTRODE APERTUREJan 19, 17Jul 20, 17[H01J]
2017/0178,933 HIGH THROUGHPUT SERIAL WAFER HANDLING END STATIONDec 27, 16Jun 22, 17[C23C, H01L]
2016/0187,302 WAFER CLAMP DETECTION BASED ON VIBRATION OR ACOUSTIC CHARACTERISTIC ANALYSISDec 09, 15Jun 30, 16[H01L, G01N]
2016/0175,804 Laser-Induced Borane Production for Ion ImplantationDec 19, 14Jun 23, 16[H01J, C01B, B01J]
2016/0087,557 SYSTEM AND METHOD FOR ELECTROSTATIC CLAMPING OF WORKPIECESSep 16, 15Mar 24, 16[H02N]
2015/0228,514 Multi Fluid Cooling System for Large Temperature Range ChuckFeb 12, 14Aug 13, 15[H01L]
2013/0305,988 Inline Capacitive Ignition of Inductively Coupled Plasma Ion SourceMay 18, 12Nov 21, 13[C23C, H05H]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9911636 Multiple diameter in-vacuum wafer handlingSep 30, 16Mar 06, 18[H01J, H01L]
9870893 Multi-piece electrode apertureJan 19, 17Jan 16, 18[H01J]
9871473 System and method for electrostatic clamping of workpiecesSep 16, 15Jan 16, 18[H01L, H02N, H01T]
9847240 Constant mass flow multi-level coolant path electrostatic chuckFeb 12, 14Dec 19, 17[H01L, F28D, F28F]
9842752 Optical heat source with restricted wavelengths for process heatingJun 21, 13Dec 12, 17[H01J, H01L, H05B]
9805912 Hydrogen COGas for carbon implantNov 17, 10Oct 31, 17[H01J]
9711324 Inert atmospheric pressure pre-chill and post-heatMay 31, 12Jul 18, 17[H01J]
9711328 Method of measuring vertical beam profile in an ion implantation system having a vertical beam angle deviceDec 17, 15Jul 18, 17[H01J]
9711329 System and method to improve productivity of hybrid scan ion beam implantersDec 28, 15Jul 18, 17[H01J, G21K]
9679739 Combined electrostatic lens system for ion implantationDec 22, 15Jun 13, 17[H01J]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0189,917 SYSTEMS AND METHODS FOR BEAM ANGLE ADJUSTMENT IN ION IMPLANTERS WITH BEAM DECELARATIONAbandonedDec 28, 15Jun 30, 16[H01J]
2015/0357,151 ION IMPLANTATION SOURCE WITH TEXTURED INTERIOR SURFACESAbandonedJun 10, 14Dec 10, 15[H01J]
2013/0305,989 METHOD AND APPARATUS FOR CLEANING RESIDUE FROM AN ION SOURCE COMPONENTAbandonedJul 23, 13Nov 21, 13[C23C]
8338315 Processes for curing silicon based low-k dielectric materialsExpiredFeb 26, 08Dec 25, 12[H01L]
2012/0161,037 Dose Measurement Method using CalorimeterAbandonedDec 23, 10Jun 28, 12[G21G]
2011/0291,022 Post Implant Wafer Heating Using LightAbandonedNov 11, 10Dec 01, 11[H01J]
2011/0272,567 Throughput Enhancement for Scanned Beam Ion ImplantersAbandonedMay 05, 10Nov 10, 11[H01J, G12B]
2011/0108,058 METHOD AND APPARATUS FOR CLEANING RESIDUE FROM AN ION SOURCE COMPONENTAbandonedNov 11, 09May 12, 11[C23C, B08B]
2010/0065,761 ADJUSTABLE DEFLECTION OPTICS FOR ION IMPLANTATIONAbandonedSep 17, 08Mar 18, 10[H01J]
7629272 Ultraviolet assisted porogen removal and/or curing processes for forming porous low k dielectricsExpiredJun 07, 05Dec 08, 09[H01L]
7488958 High conductance ion sourceExpiredMar 08, 05Feb 10, 09[G21K]
7485190 Apparatus for heating a substrate in a variable temperature process using a fixed temperature chuckExpiredFeb 15, 05Feb 03, 09[C23C]
7421973 System and method for performing SIMOX implants using an ion showerExpiredJan 21, 04Sep 09, 08[C23C]
2008/0138,178 High throughput serial wafer handling end stationAbandonedDec 06, 06Jun 12, 08[H01L]
7385799 Offset phase operation on a multiphase AC electrostatic clampExpiredFeb 07, 07Jun 10, 08[]
7352554 Method for fabricating a Johnsen-Rahbek electrostatic wafer clampExpiredJun 30, 04Apr 01, 08[H01L]
2008/0023,654 METHOD OF REDUCING TRANSIENT WAFER TEMPERATURE DURING IMPLANTATIONAbandonedJul 27, 07Jan 31, 08[H01J]
2007/0228,008 Medium pressure plasma system for removal of surface layers without substrate lossAbandonedDec 06, 05Oct 04, 07[C23F]
7276712 Method and apparatus for scanning a workpiece in a vacuum chamber of an ion beam implanterExpiredJul 01, 05Oct 02, 07[H01J]
2007/0214,631 Thermal chuck and processes for manufacturing the thermal chuckAbandonedMar 15, 06Sep 20, 07[B23P, B21B]

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