AST ELECTRONIK GMBH

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 4358
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 398
 
  
 
A21B BAKERS' OVENS; MACHINES OR EQUIPMENT FOR BAKING 217
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 276
 
  
 
B23K SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 192
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 1205
 
  
 
H03L AUTOMATIC CONTROL, STARTING, SYNCHRONISATION, OR STABILISATION OF GENERATORS OF ELECTRONIC OSCILLATIONS OR PULSES 179
 
  
 
H05B ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR 1110

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
6051512 Apparatus and method for rapid thermal processing (RTP) of a plurality of semiconductor wafersApr 11, 97Apr 18, 00[H03L]
5965047 Rapid thermal processing (RTP) system with rotating substrateOct 24, 97Oct 12, 99[C23C]
5870526 Inflatable elastomeric element for rapid thermal processing (RTP) systemJul 17, 97Feb 09, 99[A21B, L23L]
5861609 Method and apparatus for rapid thermal processingOct 02, 95Jan 19, 99[C23C, H01L, H05B]
5841110 Method and apparatus for improved temperature control in rapid thermal processing (RTP) systemsAug 27, 97Nov 24, 98[B23K]
5837555 Apparatus and method for rapid thermal processingApr 12, 96Nov 17, 98[C23C, H01L, A21B]
5727017 Method and apparatus for determining emissivity of semiconductor materialApr 10, 96Mar 10, 98[G01J, G01N]
5628564 Method and apparatus for wavevector selective pyrometry in rapid thermal processing systemsMar 28, 95May 13, 97[G01J]
5580830 Modified reaction chamber and improved gas flushing method in rapid thermal processing apparatusFeb 13, 95Dec 03, 96[H01L]
5359693 Method and apparatus for a rapid thermal processing of delicate componentsJul 14, 92Oct 25, 94[H01L]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
5935650 Method of oxidation of semiconductor wafers in a rapid thermal processing (RTP) systemExpiredOct 17, 97Aug 10, 99[C23C, H01L]

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