ASML US, LLC

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 2275
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 13192
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS792
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 6200
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 573
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 599
 
  
 
A61N ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY 3104
 
  
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 285
 
  
 
B66C CRANES; LOAD-ENGAGING ELEMENTS OR DEVICES FOR CRANES, CAPSTANS, WINCHES, OR TACKLES 229
 
  
 
F21V FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR 2108

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
7401931 Apparatus for optical beam shaping and associated methodsOct 30, 06Jul 22, 08[G02B]
7278817 Method for transferring and loading a reticleJan 24, 06Oct 09, 07[B66C]
7242456 System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portionsMay 26, 04Jul 10, 07[G03B]
7199929 Methods for optical beam shaping and diffusingApr 25, 02Apr 03, 07[G02B]
7187430 Advanced illumination system for use in microlithographyJul 22, 04Mar 06, 07[G03B]
7164463 Lithographic tool with dual isolation system and method for configuring the sameFeb 21, 03Jan 16, 07[G03B]
7137714 Apparatus for optical beam shaping and diffusing and associated methodsApr 26, 05Nov 21, 06[G02B]
7084987 Method and system to interferometrically detect an alignment markOct 07, 04Aug 01, 06[G01B]
7081278 Method for protection of adhesives used to secure optics from ultra-violet lightSep 25, 02Jul 25, 06[B05D]
7052919 Recipe cascading in a wafer processing systemOct 14, 03May 30, 06[H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
7317583 High numerical aperture projection system and method for microlithographyExpiredAug 21, 02Jan 08, 08[G02B]
7242464 Method for characterizing optical systems using holographic reticlesExpiredJul 19, 01Jul 10, 07[G01B]
7239446 Optical reduction system with control of illumination polarizationExpiredDec 10, 03Jul 03, 07[G02B]
7092070 Illumination system with spatially controllable partial coherence compensating for line width variancesExpiredOct 12, 04Aug 15, 06[G03B]
7081961 Method and apparatus for characterization of optical systemsExpiredFeb 26, 04Jul 25, 06[G01B]
7014963 Non absorbing reticle and method of making sameExpiredDec 16, 03Mar 21, 06[G03F]
7016025 Method and apparatus for characterization of optical systemsExpiredJun 24, 99Mar 21, 06[G01B]
7016051 Reticle focus measurement system using multiple interferometric beamsExpiredOct 15, 04Mar 21, 06[G01B]
7004715 Apparatus for transferring and loading a reticle with a robotic reticle end-effectorExpiredJan 09, 02Feb 28, 06[B66C]
6994444 Method and apparatus for managing actinic intensity transients in a lithography mirrorExpiredJun 14, 02Feb 07, 06[G02B]
6991416 System and method for reticle protection and transportExpiredAug 12, 02Jan 31, 06[H01L]
6984836 System and method for monitoring the topography of a wafer surface during lithographic processingExpiredMay 12, 03Jan 10, 06[G01J, G01N]
6934005 Reticle focus measurement method using multiple interferometric beamsExpiredSep 06, 02Aug 23, 05[G01B]
6922230 DUV scanner linewidth control by mask error factor compensationExpiredApr 21, 03Jul 26, 05[G03B]
6847434 Method and apparatus for a pellicle frame with porous filtering insertsExpiredDec 09, 02Jan 25, 05[G03B, G03F]
6822728 Illumination system with spatially controllable partial coherence compensation for line width variances in a photolithographic systemExpiredSep 23, 03Nov 23, 04[G03B]
2004/0179,260 Optical cubeAbandonedMar 25, 04Sep 16, 04[G02B]
6766339 Method and system for efficient and accurate filtering and interpolationExpiredJan 11, 01Jul 20, 04[G06F]
6760095 EUV condenser with non-imaging opticsExpiredFeb 07, 03Jul 06, 04[G02B, G03B]
6760641 Discrete time trajectory planner for lithography systemExpiredAug 08, 01Jul 06, 04[G06F]

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