ASML US, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 582
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 3359
 
  
 
B05B SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES 262
 
  
 
B05C APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 243
 
  
 
F27B FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS222
 
  
 
A47B TABLES; DESKS; OFFICE FURNITURE; CABINETS; DRAWERS; GENERAL DETAILS OF FURNITURE 151
 
  
 
B01D SEPARATION 1133
 
  
 
B25J MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES 157
 
  
 
B65D CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES 197
 
  
 
B65G TRANSPORT OR STORAGE DEVICES, e.g. CONVEYERS FOR LOADING OR TIPPING; SHOP CONVEYER SYSTEMS; PNEUMATIC TUBE CONVEYERS 166

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
7306114 Non-dripping nozzle apparatusOct 18, 05Dec 11, 07[B65D]
7208262 Yield and line width performance for liquid polymers and other materialsDec 07, 04Apr 24, 07[G03F]
7030039 Method of uniformly coating a substrateJun 30, 01Apr 18, 06[H01L]
6966364 Systems and methods for controlling local environmentFeb 12, 99Nov 22, 05[B05B, F24F, B01D]
6911091 Environment exchange control for material on a wafer surfaceJun 03, 02Jun 28, 05[B05C]
6844027 Environment exchange control for material on a wafer surfaceMay 02, 00Jan 18, 05[B05D]
6717113 Method for substrate thermal managementJul 02, 02Apr 06, 04[F27B]
6694218 Method and apparatus for resolving conflicts in a substrate processing systemJun 14, 02Feb 17, 04[G06F]
6689215 Method and apparatus for mitigating cross-contamination between liquid dispensing jets in close proximity to a surfaceOct 03, 02Feb 10, 04[B05C, H01L, B05B]
6616394 Apparatus for processing wafersDec 30, 98Sep 09, 03[B65H]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2007/0089,671 Yield and line width performance for liquid polymers and other materialsAbandonedNov 22, 06Apr 26, 07[B05B]
6850330 Reticle focus measurement system using multiple interferometric beamsExpiredApr 17, 03Feb 01, 05[G01B]
6729353 Modular fluid delivery apparatusExpiredMar 06, 01May 04, 04[F16K]
2003/0216,041 In-situ thermal chamber cleaningAbandonedDec 12, 02Nov 20, 03[H01L]
6619903 System and method for reticle protection and transportExpiredAug 10, 01Sep 16, 03[H01L, B65G]
6610150 Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer systemExpiredJan 13, 00Aug 26, 03[C23C]
2003/0116,280 Apparatus and method for insulating a seal in a process chamberAbandonedAug 20, 02Jun 26, 03[C23C, C23F]
2003/0104,707 System and method for improved thin dielectric filmsAbandonedMar 25, 02Jun 05, 03[H01L]
6544345 Method and system for in-situ cleaning of semiconductor manufacturing equipment using combination chemistriesExpiredJul 12, 00Apr 08, 03[B08B]
2003/0061,991 Protective shield and system for gas distributionAbandonedAug 23, 02Apr 03, 03[C23C]
2003/0044,154 Oxide structure useable for optical waveguide and method of forming the oxide structureAbandonedAug 02, 02Mar 06, 03[C03B, G02B]
6485783 Chemical vapor deposition systemExpiredNov 01, 00Nov 26, 02[C23C]
2002/0134,507 Gas delivery metering tubeAbandonedJul 13, 01Sep 26, 02[C23C, C23F]
6398373 Pneumatic control system and method for shaping deformable mirrors in lithographic projection systemsExpiredAug 09, 00Jun 04, 02[G02B]
2001/0010,950 Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer systemAbandonedJan 22, 01Aug 02, 01[H01L]

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