ASM IP HOLDING B.V.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 194192
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 14718
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 25103
 
  
 
2301 FLUID DISTRIBUTION EQUIPMENT1535
 
  
 
1303 EQUIPMENT FOR DISTRIBUTION OR CONTROL OF ELECTRIC POWER1061
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 927
 
  
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 780
 
  
 
C30B SINGLE-CRYSTAL GROWTH 749
 
  
 
H05H PLASMA TECHNIQUE 723
 
  
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 553

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0066,360 Combination CVD/ALD method, source and pulse profile modificationSep 11, 17Mar 08, 18[C23C]
2017/0350,011 MANIFOLDS FOR UNIFORM VAPOR DEPOSITIONJun 01, 16Dec 07, 17[C23C, H01L]
2017/0342,559 METHOD FOR FORMING CARBON-CONTAINING SILICON/METAL OXIDE OR NITRIDE FILM BY ALD USING SILICON PRECURSOR AND HYDROCARBON PRECURSORApr 19, 17Nov 30, 17[C23C]
2017/0306,479 DEPOSITION OF METAL BORIDES AND SILICIDESApr 21, 16Oct 26, 17[C23C]
2017/0309,457 SUBSTRATE PROCESSING APPARATUSApr 26, 16Oct 26, 17[H01J, F16K, H01L]
2017/0298,503 COMBINED ANNEAL AND SELECTIVE DEPOSITION SYSTEMSApr 18, 16Oct 19, 17[C23C, H01L]
2017/0256,401 EMISSIVITY, SURFACE FINISH AND POROSITY CONTROL OF SEMICONDUCTOR REACTOR COMPONENTSMay 16, 17Sep 07, 17[C23C, C25D, H01L]
2017/0191,164 PROCESS GAS MANAGEMENT FOR AN INDUCTIVELY-COUPLED PLASMA DEPOSITION REACTORMar 22, 17Jul 06, 17[C23C, H01J]
2017/0178,939 SUBSTRATE TRANSPORT DEVICE AND SUBSTRATE PROCESSING APPARATUSDec 17, 15Jun 22, 17[H01L]
2017/0162,366 FILM FORMING APPARATUS, RECORDING MEDIUM, AND FILM FORMING METHODDec 08, 15Jun 08, 17[H01J, C23C]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9922817 Deposition of boron and carbon containing materialsJan 06, 17Mar 20, 18[C23C, H01L]
9916980 Method of forming a structure on a substrateDec 15, 16Mar 13, 18[H01L]
9909211 Vapor deposition of LiF thin filmsJun 17, 16Mar 06, 18[C23C]
9909214 Method for depositing dielectric film in trenches by PEALDOct 15, 15Mar 06, 18[C23C, H01J, C03C, H05H, C23F, B44C]
9911676 System and method for gas-phase passivation of a semiconductor surfaceJan 03, 17Mar 06, 18[C23C, H01L]
9905416 Si precursors for deposition of SiN at low temperaturesJan 24, 17Feb 27, 18[H01L]
9905420 Methods of forming silicon germanium tin films and structures and devices including the filmsDec 01, 15Feb 27, 18[H01L]
9905492 System and method for gas-phase passivation of a semiconductor surfaceJan 03, 17Feb 27, 18[C23C, H01L]
9895715 Selective deposition of metals, metal oxides, and dielectricsFeb 03, 15Feb 20, 18[C23C, B05D]
9896762 Method of depositing and etching film in one processing apparatusDec 16, 16Feb 20, 18[C23C, H01J]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2017/0011,909 EMISSIVITY, SURFACE FINISH AND POROSITY CONTROL OF SEMICONDUCTOR REACTOR COMPONENTSAbandonedJul 06, 15Jan 12, 17[C23C, C25D, H01L]
2016/0115,590 METHOD AND SYSTEM FOR TREATMENT OF DEPOSITION REACTORAbandonedJan 04, 16Apr 28, 16[C23C]
2016/0020,094 PROCESS FOR FORMING SILICON-FILLED OPENINGS WITH A REDUCED OCCURRENCE OF VOIDSAbandonedNov 26, 14Jan 21, 16[H01L]
2015/0361,557 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHODAbandonedJun 17, 14Dec 17, 15[C23C]
2015/0125,628 METHOD OF DEPOSITING THIN FILMAbandonedMay 23, 14May 07, 15[C23C]
2015/0114,295 DEPOSITION APPARATUSAbandonedOct 23, 14Apr 30, 15[C23C]
2014/0273,531 Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURESAbandonedOct 24, 13Sep 18, 14[H01L]
2014/0116,335 UV Irradiation Apparatus with Cleaning Mechanism and Method for Cleaning UV Irradiation ApparatusAbandonedOct 31, 12May 01, 14[H01L]
2014/0109,832 DEPOSITION APPARATUSAbandonedOct 18, 13Apr 24, 14[C23C]
2013/0337,653 SEMICONDUCTOR PROCESSING APPARATUS WITH COMPACT FREE RADICAL SOURCEAbandonedJun 14, 13Dec 19, 13[H01L]
2013/0320,429 PROCESSES AND STRUCTURES FOR DOPANT PROFILE CONTROL IN EPITAXIAL TRENCH FILLAbandonedMay 31, 12Dec 05, 13[H01L]
2013/0276,707 VERTICAL FURNACE WITH CIRCUMFERENTIALLY DISTRIBUTED GAS INLET SYSTEMAbandonedApr 23, 12Oct 24, 13[C23C]
2013/0269,615 VERTICAL WAFER BOATAbandonedApr 16, 12Oct 17, 13[C23C, B65D]
2013/0247,822 DEPOSITION APPARATUSAbandonedMar 14, 13Sep 26, 13[C23C]
2013/0224,964 Method for Forming Dielectric Film Containing Si-C bonds by Atomic Layer Deposition Using Precursor Containing Si-C-Si bondAbandonedFeb 28, 12Aug 29, 13[H01L]
2012/0263,876 DEPOSITION OF SILICON DIOXIDE ON HYDROPHOBIC SURFACESAbandonedFeb 13, 12Oct 18, 12[C23C]

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