ASM INTERNATIONAL

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 2360
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1100
 
  
 
F27B FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS123

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
7927933 Method to enhance the initiation of film growthFeb 16, 05Apr 19, 11[H01L]
7645486 Method of manufacturing a silicon dioxide layerFeb 22, 07Jan 12, 10[C23C]
7122414 Method to fabricate dual metal CMOS devicesJun 19, 03Oct 17, 06[H01L]
6770851 Method and apparatus for the treatment of substratesJun 27, 02Aug 03, 04[F27B]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
6387827 Method for growing thin silicon oxides on a silicon substrate using chlorine precursorsExpiredNov 26, 97May 14, 02[H01L]

Top Inventors for This Owner

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