ASM America, Inc.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 134232
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 9427
 
  
 
C30B SINGLE-CRYSTAL GROWTH 1442
 
  
 
F26B DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM 1218
 
  
 
B65G TRANSPORT OR STORAGE DEVICES, e.g. CONVEYERS FOR LOADING OR TIPPING; SHOP CONVEYER SYSTEMS; PNEUMATIC TUBE CONVEYERS 958
 
  
 
G01K MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR 937
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 729
 
  
 
F27B FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS717
 
  
 
F16K VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING568
 
  
 
F27D DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE 520

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2016/0281,232 VAPOR FLOW CONTROL APPARATUS FOR ATOMIC LAYER DEPOSITIONJun 08, 16Sep 29, 16[C23C]
2014/0346,650 SYSTEMS AND METHODS FOR THIN-FILM DEPOSITION OF METAL OXIDES USING EXCITED NITROGEN-OXYGEN SPECIESAug 11, 14Nov 27, 14[C23C, H01L]
2013/0023,129 PRESSURE TRANSMITTER FOR A SEMICONDUCTOR PROCESSING ENVIRONMENTJul 20, 11Jan 24, 13[C23C, H01L]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9892908 Process feed management for semiconductor substrate processingMar 17, 15Feb 13, 18[C23C, H01J, H01L]
9885123 Rapid bake of semiconductor substrate with upper linear heating elements perpendicular to horizontal gas flowMar 16, 11Feb 06, 18[C23C, C30B]
9631272 Atomic layer deposition of metal carbide films using aluminum hydrocarbon compoundsNov 01, 13Apr 25, 17[C23C, H01L]
9593416 Precursor delivery systemFeb 24, 12Mar 14, 17[C23C]
9574268 Pulsed valve manifold for atomic layer depositionOct 28, 11Feb 21, 17[C23C]
9551069 Reaction apparatus having multiple adjustable exhaust portsOct 19, 11Jan 24, 17[C23C]
9481937 Selective etching of reactor surfacesApr 30, 09Nov 01, 16[C09K, C23C, C23G, C11D]
9466574 Plasma-enhanced atomic layer deposition of conductive material over dielectric layersSep 09, 13Oct 11, 16[C23C, H01L]
9394608 Semiconductor processing reactor and components thereofApr 05, 10Jul 19, 16[C23C]
9388492 Vapor flow control apparatus for atomic layer depositionDec 27, 11Jul 12, 16[C23C]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
8507039 Method for growing thin filmsExpiredJan 28, 09Aug 13, 13[C23C]
2012/0100,308 TERNARY METAL ALLOYS WITH TUNABLE STOICHIOMETRIESAbandonedOct 25, 10Apr 26, 12[B05C, H05H]
2010/0266,765 METHOD AND APPARATUS FOR GROWING A THIN FILM ONTO A SUBSTRATEAbandonedApr 21, 09Oct 21, 10[C23C]
2010/0116,207 REACTION CHAMBERAbandonedNov 05, 09May 13, 10[C23C]
2010/0107,974 SUBSTRATE HOLDER WITH VARYING DENSITYAbandonedNov 06, 08May 06, 10[B05C]
7655093 Wafer support systemExpiredJan 29, 07Feb 02, 10[C23C, H01L]
2009/0315,093 ATOMIC LAYER DEPOSITION OF METAL CARBIDE FILMS USING ALUMINUM HYDROCARBON COMPOUNDSAbandonedApr 15, 09Dec 24, 09[H01L]
2009/0280,248 POROUS SUBSTRATE HOLDER WITH THINNED PORTIONSAbandonedMay 06, 08Nov 12, 09[C23C]
2009/0186,571 AIR VENTILATION SYSTEMAbandonedJan 22, 08Jul 23, 09[F24F]
2009/0101,633 REACTOR WITH SMALL LINEAR LAMPS FOR LOCALIZED HEAT CONTROL AND IMPROVED TEMPERATURE UNIFORMITYAbandonedOct 19, 07Apr 23, 09[F27D]
2009/0079,016 METHOD FOR FORMING A DIELECTRIC STACKAbandonedNov 17, 08Mar 26, 09[H01L]
7498059 Method for growing thin filmsExpiredDec 03, 07Mar 03, 09[C23C]
2009/0052,498 THERMOCOUPLEAbandonedAug 19, 08Feb 26, 09[G01K, B05C]
2008/0289,650 LOW-TEMPERATURE CLEANING OF NATIVE OXIDEAbandonedMay 24, 07Nov 27, 08[B08B, B01J]
2008/0248,200 APPARATUS AND METHODS FOR ISOLATING CHEMICAL VAPOR REACTIONS AT A SUBSTRATE SURFACEAbandonedJun 06, 08Oct 09, 08[C23C]
7404984 Method for growing thin filmsExpiredMay 14, 01Jul 29, 08[C23C]
2008/0129,064 BERNOULLI WANDAbandonedDec 01, 06Jun 05, 08[B25J]
2008/0081,112 Batch reaction chamber employing separate zones for radiant heating and resistive heatingAbandonedSep 29, 06Apr 03, 08[C23C, B05D]
2008/0066,680 SEQUENTIAL CHEMICAL VAPOR DEPOSITIONAbandonedNov 30, 07Mar 20, 08[C23C]
2008/0032,502 SAFETY FEATURES FOR SEMICONDUCTOR PROCESSING APPARATUS USING PYROPHORIC PRECURSORAbandonedMar 01, 07Feb 07, 08[C23C, H01L]

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