ASIA IC MIC-PROCESS, INC.
Patent Owner
Stats
- 0 US PATENTS IN FORCE
- 0 US APPLICATIONS PENDING
- Dec 14, 2017 most recent publication
Details
- 0 Issued Patents
- 0 Issued in last 3 years
- 0 Published in last 3 years
- 39 Total Citation Count
- Apr 14, 1997 Earliest Filing
- 7 Expired/Abandoned/Withdrawn Patents
Patent Activity in the Last 10 Years
Technologies
Intl Class
Technology
Matters
Rank in Class
Top Patents (by citation)
Upgrade to the Professional Level to View Top Patents for this Owner. Learn More |
Recent Publications
- No Recent Publications to Display
Recent Patents
- No Recent Patents to Display
Expired/Abandoned/Withdrawn Patents
Patent #
Title
Status
Filing Date
Issue/Pub Date
Intl Class
2006/0196,283 Measurement of Thickness Profile and Elastic Modulus Profile of a Polishing PadAbandonedJan 10, 06Sep 07, 06[B24B, G01N]
2003/0062,346 Method of vacuum holes formation on carrier film of chemical mechanical polishing machineAbandonedSep 28, 01Apr 03, 03[B23K]
6524523 Method for forming dresser of chemical mechanical polishing padExpiredSep 28, 01Feb 25, 03[B22F]
5868609 Wafer carrier rotating head assembly for chemical-mechanical polishing apparatusExpiredApr 14, 97Feb 09, 99[B24B]
5843269 Slurry dispensing system for chemical-mechanical polishing apparatusExpiredApr 18, 97Dec 01, 98[B44C]
5830043 Chemical-mechanical polishing apparatus with in-situ pad conditionerExpiredApr 14, 97Nov 03, 98[B24B]
Top Inventors for This Owner
Upgrade to the Professional Level to View Top Inventors for this Owner. Learn More |
We are sorry but your current selection exceeds the maximum number of comparisons () for this membership level. Upgrade to our Level for up to -1 comparisons!
We are sorry but your current selection exceeds the maximum number of portfolios (0) for this membership level. Upgrade to our Level for up to -1 portfolios!.