ANELVA CORPORATION
Patent Owner
Stats
- 182 US PATENTS IN FORCE
- 0 US APPLICATIONS PENDING
- Sep 03, 2013 most recent publication
Details
- 182 Issued Patents
- 0 Issued in last 3 years
- 0 Published in last 3 years
- 9,494 Total Citation Count
- Dec 12, 1980 Earliest Filing
- 92 Expired/Abandoned/Withdrawn Patents
Patent Activity in the Last 10 Years
Technologies
Intl Class
Technology
Matters
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Top Patents (by citation)
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Recent Publications
- No Recent Publications to Display
Recent Patents
Patent #
Title
Filing Date
Issue Date
Intl Class
7914654 Method and apparatus for depositing a magnetoresistive multilayer filmMar 20, 07Mar 29, 11[C23C]
7159537 Device for fixing a gas showerhead or target plate to an electrode in plasma processing systemsJun 24, 04Jan 09, 07[C23C]
7091138 Forming method and a forming apparatus of nanocrystalline silicon structureAug 27, 04Aug 15, 06[H01L]
Expired/Abandoned/Withdrawn Patents
Patent #
Title
Status
Filing Date
Issue/Pub Date
Intl Class
7589002 Method of forming an oxygen- or nitrogen-terminated silicon nanocrystalline structure and an oxygen- or nitrogen-terminated silicon nanocrystalline structure formed by the methodExpiredMay 19, 08Sep 15, 09[H01L]
2009/0155,491 Film-forming method for forming metal oxide on substrate surfaceAbandonedJul 02, 08Jun 18, 09[C23C]
2008/0180,862 METHOD OF PRODUCTION OF A MAGNETORESISTANCE EFFECT DEVICEAbandonedMar 28, 08Jul 31, 08[G11B, G11C]
2005/0252,451 Cvd apparatus having means for cleaning with fluorine gas and method of cleaning cvd apparatus with fluorine gasAbandonedApr 01, 04Nov 17, 05[C23C]
6942892 Hot element CVD apparatus and a method for removing a deposited filmExpiredAug 04, 00Sep 13, 05[C23C, B05D, B08B]
6922325 Electrostatic attraction mechanism, surface processing method and surface processing deviceExpiredJul 02, 01Jul 26, 05[H01T]
2004/0255,854 Cvd apparatus and method of cleaning the cvd apparatusAbandonedApr 27, 04Dec 23, 04[C23C]
2004/0244,684 System and method of deposition of magnetic multilayer film, method of evaluation of film deposition, and method of control of film depositionAbandonedJan 27, 04Dec 09, 04[C23C]
2003/0198,743 Silicon nitride film forming apparatus and film forming methodAbandonedApr 22, 03Oct 23, 03[C23C]
2003/0143,846 Gas compositions for cleaning the interiors of reactors as well as for etching films of silicon- containing compoundsAbandonedDec 27, 02Jul 31, 03[H01L]
6590205 Ionization method for mass spectrometry and mass spectrometry apparatusExpiredAug 08, 01Jul 08, 03[H01J]
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