AIXTRON SE

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 3863
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 15347
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 432
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 4124
 
  
 
H05B ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR 4107
 
  
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 384
 
  
 
C30B SINGLE-CRYSTAL GROWTH 254
 
  
 
B01J CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS 1108
 
  
 
B05B SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES 163
 
  
 
B05C APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 144

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0327,938 DEVICE FOR DEPOSITING A LAYER ON A SUBSTRATENov 19, 15Nov 16, 17[C23C]
2017/0314,134 CVD OR PVD REACTOR FOR COATING LARGE-AREA SUBSTRATESNov 18, 15Nov 02, 17[C23C, B01J]
2017/0175,254 SUBSTRATE CARRIER THAT CARRIES A SUBSTRATE ON EACH OF TWO BROAD SIDES OF THE SUBSTRATE CARRIER THAT FACE AWAY FROM EACH OTHERMar 18, 15Jun 22, 17[C23C]
2016/0333,479 APPARATUS AND METHOD FOR REGULATING THE TEMPERATURE IN A PROCESS CHAMBER OF A CVD REACTOR USING TWO TEMPERATURE SENSOR DEVICESDec 15, 14Nov 17, 16[C23C]
2016/0225,619 METHOD AND APPARATUS FOR DEPOSITION OF A III-V SEMICONDUCTOR LAYERJan 29, 16Aug 04, 16[C23C, H01L]
2015/0292,083 DEVICE AND METHOD FOR EXHAUST GAS TREATMENT ON CVD REACTORApr 14, 15Oct 15, 15[C23C]
2014/0287,142 CVD REACTOR AND SUBSTRATE HOLDER FOR A CVD REACTORNov 02, 12Sep 25, 14[C23C]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9847241 Transport module for a semiconductor fabrication device or coupling deviceApr 16, 14Dec 19, 17[F16K, H01L, B25J, F16J]
9831466 Method for depositing a multi-layer moisture barrier on electronic devices and electronic devices protected by a multi-layer moisture barrierJun 30, 14Nov 28, 17[C23C, H01L]
9822451 Device and method for manufacturing nanostructures consisting of carbonNov 19, 14Nov 21, 17[C23C, C01B]
9793104 Preparing a semiconductor surface for epitaxial depositionJan 28, 16Oct 17, 17[C23C, H01L]
9721759 System and method for distributing RF power to a plasma sourceApr 04, 16Aug 01, 17[H01J, H05B]
9670580 MOCVD layer growth method with subsequent multi-stage cleaning stepApr 17, 14Jun 06, 17[C23C, B08B]
9587312 Gas inlet member of a CVD reactorJul 05, 12Mar 07, 17[C23C, C30B]
9564329 Method and apparatus for fabricating dielectric structuresNov 25, 14Feb 07, 17[C23C, H01L]
9447500 CVD reactor having a substrate holder resting on a gas cushion comprising a plurality of zonesOct 08, 10Sep 20, 16[C23C]
9443702 Methods for plasma processingJun 09, 15Sep 13, 16[H01J, C23C, H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2017/0125,269 TRANSFER MODULE FOR A MULTI-MODULE APPARATUSAbandonedOct 29, 15May 04, 17[H01L]
2016/0289,837 APPARATUS AND METHOD FOR FORMING THIN PROTECTIVE AND OPTICAL LAYERS ON SUBSTRATESAbandonedJun 01, 16Oct 06, 16[C23C, H01J]
2016/0068,961 Method and Apparatus For Growing Binary, Ternary and Quaternary Materials on a SubstrateAbandonedSep 05, 14Mar 10, 16[C23C]
2015/0303,091 DEVICE FOR ORIENTING A WAFER ON A WAFER CARRIERAbandonedNov 04, 13Oct 22, 15[H01L]
2014/0186,527 Device and method for processing strip-type substratesAbandonedNov 26, 13Jul 03, 14[C23C]
2013/0337,657 APPARATUS AND METHOD FOR FORMING THIN PROTECTIVE AND OPTICAL LAYERS ON SUBSTRATESAbandonedJun 19, 13Dec 19, 13[H01L]
2013/0045,548 Apparatus and method for simultaneous deposition of a plurality of semiconductor layers in a plurality of process chambersAbandonedApr 16, 11Feb 21, 13[H01L]
2013/0040,054 COATING DEVICE AND METHOD FOR OPERATING A COATING DEVICE HAVING A SHIELDING PLATEAbandonedFeb 08, 11Feb 14, 13[C23C]
8298337 Gas inlet element for a CVD reactorExpiredJan 05, 06Oct 30, 12[C23C, H01L]
2012/0263,877 CVD Reactor Having Gas Inlet Zones that Run in a Strip-Like Manner and a Method for Deposition of a Layer on a Substrate in a CVD Reactor of this KindAbandonedAug 02, 10Oct 18, 12[C23C]
2012/0156,396 CVD REACTORAbandonedAug 30, 10Jun 21, 12[C23C]
2012/0003,389 MOCVD REACTOR HAVING A CEILING PANEL COUPLED LOCALLY DIFFERENTLY TO A HEAT DISSIPATION MEMBERAbandonedMar 10, 10Jan 05, 12[C23C]
2011/0005,682 Apparatus for Plasma ProcessingAbandonedJul 08, 10Jan 13, 11[C23F]

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