AIXTRON, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 14348
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1091
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 234
 
  
 
B05C APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 144
 
  
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 186
 
  
 
C30B SINGLE-CRYSTAL GROWTH 155
 
  
 
H05B ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR 1110
 
  
 
H05H PLASMA TECHNIQUE 129

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8986453 Device for coating substrates disposed on a susceptorJun 13, 08Mar 24, 15[C23C, B05C, H01L, C30B]
8308867 Device for the temperature control of the surface temperatures of substrates in a CVD reactorJun 03, 08Nov 13, 12[C23C]
8157915 CVD reactor having a process-chamber ceiling which can be loweredApr 17, 07Apr 17, 12[C23C, H01L, B05D, C23F]
8152924 CVD reactor comprising a gas inlet memberNov 11, 06Apr 10, 12[C23C, H01L, C23F]
8062426 CVD reactor with RF-heated process chamberDec 12, 05Nov 22, 11[C23C]
7732308 Process for depositing layers containing silicon and germaniumFeb 22, 05Jun 08, 10[H01L]
6638862 Radical-assisted sequential CVDAug 06, 02Oct 28, 03[H01L]
6630401 Radical-assisted sequential CVDAug 06, 02Oct 07, 03[H01L]
6479902 Semiconductor catalytic layer and atomic layer deposition thereofJun 29, 00Nov 12, 02[H01L]
6475910 Radical-assisted sequential CVDSep 22, 00Nov 05, 02[H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2011/0237,051 PROCESS AND APPARATUS FOR DEPOSITION OF MULTICOMPONENT SEMICONDUCTOR LAYERSAbandonedMar 26, 10Sep 29, 11[H01L]
7981472 Methods of providing uniform gas delivery to a reactorExpiredSep 03, 09Jul 19, 11[C23C]
2010/0273,320 DEVICE AND METHOD FOR SELECTIVELY DEPOSITING CRYSTALLINE LAYERS USING MOCVD OR HVPEAbandonedFeb 21, 08Oct 28, 10[C23C, H01L, C30B]
2010/0170,438 GAS DISTRIBUTOR COMPRISING A PLURALITY OF DIFFUSION-WELDED PANES AND A METHOD FOR THE PRODUCTION OF SUCH A GAS DISTRIBUTORAbandonedJun 04, 08Jul 08, 10[C23C, B23K]
2010/0162,957 DEVICE FOR COATING A PLURALITY OF CLOSEST PACKED SUBSTRATES ARRANGED ON A SUSCEPTORAbandonedMay 21, 08Jul 01, 10[C23C]
2010/0012,036 ISOLATION FOR MULTI-SINGLE-WAFER PROCESSING APPARATUSAbandonedJul 13, 09Jan 21, 10[C23C]
2010/0003,405 METHOD FOR DEPOSITING LAYERS IN A CVD REACTOR AND GAS INLET ELEMENT FOR A CVD REACTORAbandonedNov 21, 06Jan 07, 10[C23C, B05D]
2009/0283,040 DEVICE FOR TEMPERATURE-CONTROLLED ACCOMMODATION OF A CONTAINERAbandonedDec 06, 05Nov 19, 09[C23C]
2009/0183,682 SOURCE CONTAINER OF A VPE REACTORAbandonedMay 07, 07Jul 23, 09[C23C]
2009/0110,805 Apparatus and Method for Controlling the Surface Temperature of a Substrate in a Process ChamberAbandonedApr 17, 07Apr 30, 09[C23C]
2009/0107,401 DEVICE FOR VAPORIZING CONDENSED SUBSTANCESAbandonedDec 16, 05Apr 30, 09[C23C]
2008/0274,278 Method for Depositing in Particular Metal Oxides by Means of Discontinuous Precursor InjectionAbandonedMar 09, 05Nov 06, 08[C23C]
2008/0251,020 Cvd-Reactor with Slidingly Mounted Susceptor HolderAbandonedNov 17, 06Oct 16, 08[C23C]
2008/0206,464 Method and Device for the Depositing of Gallium Nitrite Layers on a Sapphire Substrate and Associated Substrate HolderAbandonedNov 18, 05Aug 28, 08[C23C, B05B]
2008/0096,369 Apparatus and method for high-throughput chemical vapor depositionAbandonedJul 01, 05Apr 24, 08[C23C, H01L]
2008/0072,821 SMALL VOLUME SYMMETRIC FLOW SINGLE WAFER ALD APPARATUSAbandonedJul 20, 07Mar 27, 08[C23C]
2007/0234,956 METHOD AND APPARATUS FOR PROVIDING UNIFORM GAS DELIVERY TO A REACTORAbandonedApr 05, 06Oct 11, 07[C23C]
2007/0042,119 Vaporizer for atomic layer deposition systemAbandonedFeb 10, 06Feb 22, 07[C23C]
7129580 Methods and procedures for engineering of composite conductive films by atomic layer depositionExpiredAug 30, 05Oct 31, 06[H01L]
2006/0137,609 Multi-single wafer processing apparatusAbandonedSep 12, 05Jun 29, 06[C23C]

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