ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI

Patent Owner

Watch Compare Add to Portfolio

Stats

Details

Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1190
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 9353
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 7121
 
  
 
C25D PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING 249
 
  
 
C30B SINGLE-CRYSTAL GROWTH 254
 
  
 
F16L PIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL268
 
  
 
B05B SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES 163
 
  
 
B25J MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES 157
 
  
 
F27D DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE 124
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 177

Top Patents (by citation)

Upgrade to the Professional Level to View Top Patents for this Owner. Learn More

Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0186,585 ELECTRODE STRUCTURE FOR ICP ETCHERDec 21, 16Jun 29, 17[H01J]
2017/0186,592 MULTI-ZONE ACTIVE-MATRIX TEMPERATURE CONTROL SYSTEM AND TEMPERATURE CONTROL METHOD, AND ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS APPLY THEREOFDec 15, 16Jun 29, 17[H01J, H01L]
2017/0154,780 SUBSTRATE PROCESSING METHOD AND APPARATUS THEREOFNov 28, 16Jun 01, 17[H01J, H01L]
2016/0351,429 PROCESSING CHAMBER, COMBINATION OF PROCESSING CHAMBER AND LOADLOCK, AND SYSTEM FOR PROCESSING SUBSTRATESNov 25, 15Dec 01, 16[H01J, H01L, B25J]
2016/0322,205 ICP SOURCE DESIGN FOR PLASMA UNIFORMITY AND EFFICIENCY ENHANCEMENTJul 11, 16Nov 03, 16[H01J, H01L]
2016/0240,726 PROCESS COMPONENT AND METHOD TO IMPROVE MOCVD REACTION PROCESSFeb 12, 16Aug 18, 16[H01L]
2015/0024,330 APPARATUS AND METHOD FOR CONTROLLING HEATING OF BASE WITHIN CHEMICAL VAPOUR DEPOSITION CHAMBERMar 21, 13Jan 22, 15[C23C, F27D]
2014/0116,338 COATING FOR PERFORMANCE ENHANCEMENT OF SEMICONDUCTOR APPARATUSOct 28, 13May 01, 14[C23C]
2013/0125,820 CHEMICAL VAPOR DEPOSITION OR EPITAXIAL-LAYER GROWTH REACTOR AND SUPPORTER THEREOFNov 20, 12May 23, 13[C23C, C30B]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9851151 Apparatus and method for controlling heating of base within chemical vapour deposition chamberMar 21, 13Dec 26, 17[C23C, H05B, F27D]
9696209 Method for measuring temperature of film in reaction chamberJul 16, 14Jul 04, 17[G01J]
9633884 Performance enhancement of coating packaged ESC for semiconductor apparatusOct 28, 13Apr 25, 17[C23C, H01L, H01T]
9617633 Coating packaged chamber parts for semiconductor plasma apparatusOct 29, 13Apr 11, 17[C23C, C25D]
9534724 Gas showerhead, method for making the same and thin film growth reactorMay 09, 13Jan 03, 17[C23C, F16L, H01L, C30B]
9443715 Method and device for measuring temperature of substrate in vacuum processing apparatusMay 06, 13Sep 13, 16[C23C, G01K, H01L]
9431216 ICP source design for plasma uniformity and efficiency enhancementOct 29, 13Aug 30, 16[C23C, H01J, H01L]
9382619 Cleaning apparatus and method, and film growth reaction apparatus and methodApr 05, 12Jul 05, 16[C23C]
9230781 Capacitive-coupled plasma processing apparatus and method for processing substrateAug 01, 12Jan 05, 16[H01J, H05H]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2014/0117,120 COATING PACKAGED SHOWERHEAD PERFORMANCE ENHANCEMENT FOR SEMICONDUCTOR APPARATUSAbandonedOct 28, 13May 01, 14[B05B]
2014/0083,452 METHOD FOR IN SITU CLEANING OF MOCVD REACTION CHAMBERAbandonedSep 19, 13Mar 27, 14[B08B]
2014/0083,453 METHOD FOR IN SITU CLEANING OF MOCVD REACTION CHAMBERAbandonedSep 19, 13Mar 27, 14[C23C]
2013/0344,244 METHOD FOR CLEANING GAS CONVEYING DEVICE, AND METHOD AND REACTION DEVICE FOR FILM GROWTHAbandonedMar 23, 12Dec 26, 13[C23C]
2013/0062,311 INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS AND METHOD FOR PROCESSING SUBSTRATE WITH THE SAMEAbandonedAug 29, 12Mar 14, 13[B05C, H05H, B44C]

Top Inventors for This Owner

Upgrade to the Professional Level to View Top Inventors for this Owner. Learn More

We are sorry but your current selection exceeds the maximum number of comparisons () for this membership level. Upgrade to our Level for up to -1 comparisons!

We are sorry but your current selection exceeds the maximum number of portfolios (0) for this membership level. Upgrade to our Level for up to -1 portfolios!.