ADVANCED ION BEAM TECHNOLOGY, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 4187
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 20342
 
  
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 1432
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 893
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 3203
 
  
 
G21G CONVERSION OF CHEMICAL ELEMENTS; RADIOACTIVE SOURCES 314
 
  
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 2157
 
  
 
A61N ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY 1106
 
  
 
B05C APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 144
 
  
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 157

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0125,211 METHOD OF CLEANING ELECTROSTATIC CHUCKOct 19, 16May 04, 17[H01J, H02N, B08B]
2017/0069,467 PLASMA-BASED PROCESSING SYSTEM AND OPERATION METHOD THEREOFSep 01, 16Mar 09, 17[H01J, C23C]
2015/0056,380 ION SOURCE OF AN ION IMPLANTERAug 23, 13Feb 26, 15[H01J]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9852887 Ion source of an ion implanterAug 23, 13Dec 26, 17[H01J]
9824850 Deceleration apparatus for ribbon and spot beamsJan 26, 15Nov 21, 17[H01J]
9748072 Lower dose rate ion implantation using a wider ion beamJun 23, 14Aug 29, 17[H01J]
9697988 Ion implantation system and processOct 14, 15Jul 04, 17[H01J]
9653253 Plasma-based material modification using a plasma source with magnetic confinementMar 07, 14May 16, 17[H01J]
9450078 Forming punch-through stopper regions in finFET devicesApr 03, 15Sep 20, 16[H01L]
9431247 Method for ion implantationJun 26, 15Aug 30, 16[H01J, H01L]
9368326 Scan head and scan arm using the sameJun 17, 13Jun 14, 16[H01J, G01N]
9340870 Magnetic field fluctuation for beam smoothingFeb 15, 13May 17, 16[C23C, H01J]
9281162 Single bend energy filter for controlling deflection of charged particle beamJun 27, 14Mar 08, 16[H01J]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0233,047 PLASMA-BASED MATERIAL MODIFICATION WITH NEUTRAL BEAMAbandonedApr 20, 16Aug 11, 16[H01J, H01L]
2016/0217,970 ION IMPLANTER AND METHOD FOR ION IMPLANTATIONAbandonedJan 28, 15Jul 28, 16[H01J, H01L]
2016/0203,950 METHOD AND ION IMPLANTER FOR LOW TEMPERATURE IMPLANTATIONAbandonedJan 13, 15Jul 14, 16[H01J, C23C, G01K]
2016/0076,142 Deposition Apparatus and Deposition Method Using the SameAbandonedNov 25, 15Mar 17, 16[C23C, H01L]
2014/0175,568 REPLACEMENT SOURCE/DRAIN FINFET FABRICATIONAbandonedMar 03, 14Jun 26, 14[H01L]
2013/0299,722 ION IMPLANTATION METHOD AND ION IMPLANTERAbandonedJul 18, 13Nov 14, 13[H01J]
2012/0317,993 APPARATUS AND METHOD FOR CONTROLLING WORKPIECE TEMPERATUREAbandonedJun 17, 11Dec 20, 12[F25B]
2012/0281,333 TEMPERATURE-CONTROLLABLE ELECTROSTATIC CHUCKAbandonedMay 06, 11Nov 08, 12[H01L]
2012/0196,047 DETERMINING RELATIVE SCAN VELOCITY TO CONTROL ION IMPLANTATION OF WORK PIECEAbandonedJan 28, 11Aug 02, 12[C23C, B05C, G06F, G06G]
2012/0126,137 ION IMPLANTATION METHOD AND ION IMPLANTERAbandonedNov 19, 10May 24, 12[H01J, G21K]
2011/0278,478 METHOD AND IMPLANTER FOR IMPLANTING A WORKPIECEAbandonedMay 17, 10Nov 17, 11[H01J]
2011/0049,383 ION IMPLANTER AND ION IMPLANT METHOD THEREOFAbandonedSep 03, 09Mar 03, 11[C23C, H01J]
2011/0018,423 INDIRECT HEATED CATHODE OF ION IMPLANTERAbandonedJul 27, 09Jan 27, 11[H01J]
2010/0301,236 Shorten Temperature Recovery Time of Low Temperature Ion ImplantationAbandonedMay 26, 09Dec 02, 10[H01J]
2010/0200,775 Real Time Monitoring Ion BeamAbandonedFeb 12, 09Aug 12, 10[H01J]
2010/0181,501 APPARATUS FOR SUB-ZERO DEGREE C ION IMPLANTATIONAbandonedJan 21, 09Jul 22, 10[H01J]
2006/0163,490 Ion implantation cooling systemAbandonedJan 19, 06Jul 27, 06[H01J]
2006/0102,080 Reduced particle generation from wafer contacting surfaces on wafer paddle and handling facilitiesAbandonedDec 02, 04May 18, 06[C23C]
6918351 Apparatus for ion beam implantationExpiredApr 26, 02Jul 19, 05[C23C, H01G]
6865065 Semiconductor processing chamber substrate holder method and structureExpiredJan 22, 02Mar 08, 05[H05F]

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