ADE Corporation
Patent Owner
Stats
- 36 US PATENTS IN FORCE
- 0 US APPLICATIONS PENDING
- Jul 30, 2013 most recent publication
Details
- 36 Issued Patents
- 0 Issued in last 3 years
- 0 Published in last 3 years
- 2,000 Total Citation Count
- Oct 11, 1977 Earliest Filing
- 31 Expired/Abandoned/Withdrawn Patents
Patent Activity in the Last 10 Years
Technologies
Intl Class
Technology
Matters
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Top Patents (by citation)
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Recent Publications
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Recent Patents
Patent #
Title
Filing Date
Issue Date
Intl Class
8497984 System and method for inspection of a workpiece surface using multiple scattered light collectorsDec 17, 05Jul 30, 13[G01N]
7623227 System and method for inspecting a workpiece surface using polarization of scattered lightDec 17, 05Nov 24, 09[G01N]
7605913 System and method for inspecting a workpiece surface by analyzing scattered light in a front quartersphere region above the workpieceDec 17, 05Oct 20, 09[G01N]
7557910 System and method for controlling a beam source in a workpiece surface inspection systemDec 17, 05Jul 07, 09[G01N]
7505125 System and method for signal processing for a workpiece surface inspection systemDec 17, 05Mar 17, 09[G01N]
7286218 System and method for inspecting a workpiece surface using surface structure spatial frequenciesDec 17, 05Oct 23, 07[G01N]
Expired/Abandoned/Withdrawn Patents
Patent #
Title
Status
Filing Date
Issue/Pub Date
Intl Class
7417722 System and method for controlling light scattered from a workpiece surface in a surface inspection systemExpiredDec 17, 05Aug 26, 08[G01N]
7346883 System and method for integrated data transfer, archiving and purging of semiconductor wafer dataExpiredJul 08, 05Mar 18, 08[G06F]
7343583 System and method for searching for patterns of semiconductor wafer features in semiconductor wafer dataExpiredJul 08, 05Mar 11, 08[G06F]
2006/0192,949 System and method for inspecting a workpiece surface by analyzing scattered light in a back quartersphere region above the workpieceAbandonedDec 17, 05Aug 31, 06[G01N]
2006/0192,950 System and method for inspecting a workpiece surface using combinations of light collectorsAbandonedDec 17, 05Aug 31, 06[G01N]
2006/0009,943 Method and system for managing, analyzing and automating data in the production of semiconductor wafers and for monitoring the production processAbandonedJul 08, 05Jan 12, 06[G01M]
2004/0258,295 Method and system for classifying defects occurring at a surface of a substrate using graphical representation of multi-channel dataAbandonedJun 10, 04Dec 23, 04[G06K]
2004/0252,879 Method and system for analyzing and tracking defects among a plurality of substrates such as silicon wafersAbandonedJun 10, 04Dec 16, 04[G01N, G06K]
6760100 Method and apparatus for classifying defects occurring at or near a surface of a smooth substrateExpiredMar 12, 01Jul 06, 04[G01N]
6621581 Method and apparatus for mapping surface topography of a substrateExpiredOct 15, 99Sep 16, 03[G01B]
6275770 Method to remove station-induced error pattern from measured object characteristics and compensate the measured object characteristics with the errorExpiredMay 27, 99Aug 14, 01[G01N]
5708368 Method and apparatus for emulation of a linear variable differential transducer by a capacitive gaging systemExpiredMar 07, 96Jan 13, 98[G01R]
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